3 resultados para Atomic ratio, Maximum

em Cambridge University Engineering Department Publications Database


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Structural changes induced by the incorporation of nitrogen into ta-C : H films have been studied by Electron Energy Loss Spectroscopy, X-Ray Photoelectron Spectroscopy, Fourier Transformed Infrared Spectroscopy and Ultraviolet-Visible Spectroscopy. ta-C:H films have been synthesised using a low pressure Electron Cyclotron Wave Resonance (ECWR) source which provides a plasma beam with a high degree of ionisation and dissociation. Nitrogen was incorporated by adding N2 to the C2H2 plasma used for the deposition of ta-C : H films. The N/C atomic ratio in the films rises rapidly until the N2/C2H2 gas ratio reaches three, and then increases more gradually, while the deposition rate decreases steeply. Chemical sputtering of the forming films and the formation of molecular nitrogen within the films limit the maximum nitrogen content to about N/C = 0.6. For low nitrogen content the films retain their diamond-like properties, however as N/C atomic ratio increases, a polymeric-like material is formed, with >C=N- structures and terminating C=N and NH groups that decrease the connectivity of the network.

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Two new maximum power point tracking algorithms are presented: the input voltage sensor, and duty ratio maximum power point tracking algorithm (ViSD algorithm); and the output voltage sensor, and duty ratio maximum power point tracking algorithm (VoSD algorithm). The ViSD and VoSD algorithms have the features, characteristics and advantages of the incremental conductance algorithm (INC); but, unlike the incremental conductance algorithm which requires two sensors (the voltage sensor and current sensor), the two algorithms are more desirable because they require only one sensor: the voltage sensor. Moreover, the VoSD technique is less complex; hence, it requires less computational processing. Both the ViSD and the VoSD techniques operate by maximising power at the converter output, instead of the input. The ViSD algorithm uses a voltage sensor placed at the input of a boost converter, while the VoSD algorithm uses a voltage sensor placed at the output of a boost converter. © 2011 IEEE.

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The findings presented herein show that the electronic properties of CVD graphene on nickel can be altered from metallic to semiconducting by introducing oxygen adsorbates via UV/ozone or oxygen plasma treatment. These properties can be partially recovered by removing the oxygen adsorbates via vacuum annealing treatment. The effect of oxidation is studied by scanning tunneling microscopy/spectroscopy (STM/STS) and X-ray photoelectron spectroscopy (XPS). As probed by STM/STS, an energy gap opening of 0.11-0.15 eV is obtainable as the oxygen/carbon atomic ratio reaches 13-16%. The corresponding XPS spectra show a significant monotonic increase in the concentration of oxygenated functional groups due to the oxidation treatments. This study demonstrates that the opening of energy gap in CVD graphene can be reasonably controlled by a combination of UV/ozone or oxygen plasma treatment and vacuum annealing treatment. © 2013 Elsevier B.V.