163 resultados para Dense Plasma

CVD diamond: a novel high γ-coating for plasma display panels?

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Dual ion plasma-beam sources used to maximise sp^3 C–C bonds in carbon nitride

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Deposition of carbon nitride films using an electron cyclotron wave resonance plasma source

Relevância:

20.00% 20.00%

Publicador:

Veja mais

High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Optical and electrical properties of a-C:H deposited by magnetic confinement of r.f. PECVD plasma

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Low-temperature anodic oxidation of silicon using a wave resonance plasma source

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Abrasive wear resistance of plasma-sprayed tungsten carbide-cobalt coatings

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Stability of electron emission current in hydrogen-free diamond-like carbon deposited by plasma enhanced chemical vapor deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Relationship between field emission characteristics and hydrogen content in diamondlike carbon deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Relationship between microstructure and erosive wear resistance of plasma sprayed alumina coatings

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Simulation of plasma flow in toroidal solenoid filters

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Interactions of the directed plasma from a cathodic arc with electrodes and magnetic fields

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc

Relevância:

20.00% 20.00%

Publicador:

Veja mais