Deposition of small particles from turbulent flows

This paper deals with particle deposition onto solid walls from turbulent flows. The aim of the study is to model particle deposition in industrial flows, such as the one in gas turbines. The numerical study has been carried out with a two fluid approach. The possible contribution to the deposition from Brownian diffusion, turbulent diffusion and shear-induced lift force are considered in the study. Three types of turbulent two-phase flows have been studied: turbulent channel flow, turbulent flow in a bent duct and turbulent flow in a turbine blade cascade. In the turbulent channel flow case, the numerical results from a two-dimensional code show good agreement with numerical and experimental results from other resources. Deposition problem in a bent duct flow is introduced to study the effect of curvature. Finally, the deposition of small particles on a cascade of turbine blades is simulated. The results show that the current two fluid models are capable of predicting particle deposition rates in complex industrial flows.

How to achieve high mobility thin film transistors by direct deposition of silicon using 13.56 MHz RF PECVD?

CMOS nanocrystalline silicon thin film transistors with high field effect mobility are reported. The transistors were directly deposited by radio-frequency plasma enhanced chemical vapor deposition at 150°C The transistors show maximum field effect mobility of 450 cm2/V-s for electrons and 100 cm2/V-s for holes at room temperature. We attribute the high mobilities to a reduction of the oxygen content, which acts as an accidental donor. Indeed, secondary ion mass spectrometry measurements show that the impurity concentration in the nanocrystalline Si layer is comparable to, or lower than, the defect density in the material, which is already low thanks to hydrogen passivation.

Supersonic laser deposition of Ti and Ti64 alloys

The importance of metal coating technologies drives the continuous improvement of metal deposition techniques for application in a wide range of industrial sectors. This work presents the foundations of a new process technology for the deposition of Ti and Ti64 coatings on various substrates using supersonic powder streams and impact site laser heating. Full density metallic deposits are obtained under appropriate impact conditions without the need for transiting the melting point of the deposited material or substrate leading to large energy savings. Details of the experimental approach will be presented along with the general characteristics of the titanium coatings produced using this novel coatings method.

The deposition of small particles from a turbulent air flow in a curved duct

The paper describes an experimental and theoretical study of the deposition of small spherical particles from a turbulent air flow in a curved duct. The objective was to investigate the interaction between the streamline curvature of the primary flow and the turbulent deposition mechanisms of diffusion and turbophoresis. The experiments were conducted with particles of uranine (used as a fluorescent tracer) produced by an aerosol generator. The particles were entrained in an air flow which passed vertically downwards through a long straight channel of rectangular cross-section leading to a 90° bend. The inside surfaces of the channel and bend were covered with tape to collect the deposited particles. Following a test run the tape was removed in sections, the uranine was dissolved in sodium hydroxide solution and the deposition rates established by measuring the uranine concentration with a luminescence spectrometer. The experimental results were compared with calculations of particle deposition in a curved duct using a computer program that solved the ensemble-averaged particle mass and momentum conservation equations. A particle density-weighted averaging procedure was used and the equations were expressed in terms of the particle convective, rather than total, velocity. This approach provided a simpler formulation of the particle turbulence correlations generated by the averaging process. The computer program was used to investigate the distance required to achieve a fully-developed particle flow in the straight entry channel as well as the variation of the deposition rate around the bend. The simulations showed good agreement with the experimental results. © 2012 Elsevier Ltd.

Chemical vapor deposition of nanocrystalline graphene directly on arbitrary high-temperature insulating substrates

Large area uniform nanocrystalline graphene is grown by chemical vapor deposition on arbitrary insulating substrates that can survive ∼1000°C. The as-synthesized graphene is nanocrystalline with a domain size in the order of ∼10 nm. The material possesses a transparency and conductivity similar to standard graphene fabricated by exfoliation or catalysis. A noncatalytic mechanism is proposed to explain the experimental phenomena. The developed technique is scalable and reproducible, compatible with the existing semiconductor technology, and thus can be very useful in nanoelectronic applications such as transparent electronics, nanoelectromechanical systems, as well as molecular electronics. © 2012 IEEE.