83 resultados para external morphology


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In addition to the structural control of individual carbon nanotubes (CNTs), the morphological control of their assemblies is crucial to realize miniaturized CNT devices. Microgradients in the thickness of catalyst are used to enrich the variety of available self-organized morphologies of CNTs. Microtrenches were fabricated in gate/spacer/cathode trilayers using a conventional self-aligned top-down process and catalyst exhibiting a microgradient in its thickness was formed on the cathode by sputter deposition through gate slits. CNTs, including single-walled CNTs, of up to 1μm in length were grown within 5-15 s by chemical vapor deposition. The tendency of thin CNTs to aggregate caused interactions between CNTs with different growth rates, yielding various morphologies dependent on the thickness of the catalyst. The field emission properties of several types of CNT assemblies were evaluated. The ability to produce CNTs with tailored morphologies by engineering the spatial distribution of catalysts will enhance their performance in devices. © 2011 The Japan Society of Applied Physics.

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Electrical double-layer capacitors owe their large capacitance to the formation of a double-layer at the electrode/electrolyte interface of high surface area carbon-based electrode materials. Greater electrical energy storage capacity has been attributed to transition metal oxides/nitrides that undergo fast, reversible redox reactions at the electrode surface (pseudo-capacitive behavior) in addition to forming electrical double-layers. Solution Precursor Plasma Spray (SPPS) has shown promise for depositing porous, high surface area transition metal oxides. This investigation explored the potential of SPPS to fabricate a-MoO 3 coatings with micro-structures suitable for use as super-capacitor electrodes. The effects of number of spray passes, spray distance, solution concentration, flow rate and spray velocity on the chemistry and micro-structure of the a-MoO 3 deposits were examined. DTA/TGA, SEM, XRD, and electrochemical analyses were performed to characterize the coatings. The results demonstrate the importance of post-deposition heating of the deposit by subsequent passes of the plasma on the coating morphology. © ASM International.

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Atomic force microscopy (AFM) and scanning electron microscopy (SEM) with cathodoluminescence (CL) were performed on exactly the same defects in a blue-emitting InGaN/GaN multiple quantum well (QW) sample enabling the direct correlation of the morphology of an individual defect with its emission properties. The defects in question are observed in AFM and SEM as a trench partially or fully enclosing a region of the QW having altered emission properties. Their sub-surface structure has previously been shown to consist of a basal plane stacking fault (BSF) in the plane of the QW stack, and a stacking mismatch boundary (SMB) which opens up into a trench at the sample surface. In CL, the material enclosed by the trench may emit more or less intensely than the surrounding material, but always exhibits a redshift relative to the surrounding material. A strong correlation exists between the width of the trench and both the redshift and the intensity ratio, with the widest trenches surrounding regions which exhibit the brightest and most redshifted emission. Based on studies of the evolution of the trench width with the number of QWs from four additional MQW samples, we conclude that in order for a trench defect to emit intense, strongly redshifted light, the BSF must be formed in the early stages of the growth of the QW stack. The data suggest that the SMB may act as a non-radiative recombination center. © 2013 American Institute of Physics.

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Pancake or racetrack coils wound with second generation high-temperature superconductors (2G HTSs) are important elements for numerous applications of HTS. The applications of these coils are primarily in rotating machines such as motors and generators where they must withstand external magnetic fields from various orientations. The characterization of 2G HTS coils is mostly focused on AC loss assessment, critical current and maximum magnetic field evaluation. In this study, racetrack coils will be placed in different orientations of external magnetic fields - Jc (Ic) versus angle measurements will be performed and interpreted. Full attention is paid to studies of anisotropy Jc versus angle curves for short samples of 2G HTS tapes. As will be shown, the shape of the Jc versus angle curves for tapes has a strong influence on the Jc (Ic) versus angle curves for coils. In this work, a unique and unpredicted behavior of the Jc versus angle curves for the 2G HTS racetrack coils was found. This will be analyzed and fully explained. © 2013 IOP Publishing Ltd.

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We investigate vertical and defect-free growth of GaAs nanowires on Si (111) substrates via a vapor-liquid-solid (VLS) growth mechanism with Au catalysts by metal-organic chemical vapor deposition (MOCVD). By using annealed thin GaAs buffer layers on the surface of Si substrates, most nanowires are grown on the substrates straight, following (111) direction; by using two temperature growth, the nanowires were grown free from structural defects, such as twin defects and stacking faults. Systematic experiments about buffer layers indicate that V/III ratio of precursor and growth temperature can affect the morphology and quality of the buffer layers. Especially, heterostructural buffer layers grown with different V/III ratios and temperatures and in-situ post-annealing step are very helpful to grow well arranged, vertical GaAs nanowires on Si substrates. The initial nanowires having some structural defects can be defect-free by two-temperature growth mode with improved optical property, which shows us positive possibility for optoelectronic device application. ©2010 IEEE.

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The effects of growth temperature and V/III ratio on the morphology and crystallographic phases of InP nanowires that are grown by metal organic chemical vapour deposition have been studied. We show that higher growth temperatures or higher V/III ratios promote the formation of wurtzite nanowires while zinc-blende nanowires are favourableat lower growth temperatures and lower V/III ratios. A schematic map of distribution of zinc-blende and wurtzite structures has been developed in the range of growth temperatures (400-510 °C) and V/III ratios (44 to 700) investigated in this study. © 2010 IOP Publishing Ltd.

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The normal shock wave / boundary layer interaction (normal SBLI) is important to the operation and performance of a supersonic inlet, and the normal SBLI is particularly prominent in external compression inlets. To improve our understanding of such interactions, it is helpful to make use of fundamental flows which capture the main elements of inlets, without resorting to the level of complexity and system integration associated with full-geometry inlets. In this paper, several fundamental fiow-fleld configurations have been considered as possible test cases to represent the normal SBLI aspects found in typical external compression inlets, and it was found that the spillage-diffuser more closely retains the basic flow features of an external compression inlet than the other configurations. In particular, this flow-fleld allows the normal shock Mach number as well as the amount and rate of subsonic diffusion to be all held approximately constant mid independent of the application of flow control. In addition, a survey of several external compression inlets was conducted to quantify the flow and geometric parameters of the spillage-diffuser relevant to actual inlets. The results indicated that such a flow may be especially relevant if the terminal Mach number is about 1.3 to 1.4, the confinement parameter is around 10%, the width around twice or three times the height, and with the area expansion just downstream of the shock on the conservative side of the stall limit for incompressible diffusers. © 2013 by the American Institute of Aeronautics and Astronautics, Inc. All rights reserved.

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The normal shock wave/boundary-layer interaction is important to the operation and performance of a supersonic inlet, and the normal shock wave/boundary-layer interaction is particularly prominent in external compression inlets. To improve understanding of such interactions, it is helpful to make use of fundamental flows that capture the main elements of inlets, without resorting to the level of complexity and system integration associated with full-geometry inlets. In this paper, several fundamental flowfield configurations have been considered as possible test cases to represent the normal shock wave/boundary-layer interaction aspects found in typical external compression inlets, and it was found that the spillage diffuser more closely retains the basic flow features of an external compression inlet than the other configurations. In particular, this flowfield allows the normal shock Mach number as well as the amount and rate of subsonic diffusion to all be held approximately constant and independent of the application of flow control. In addition, a survey of several external compression inlets was conducted to quantify the flow and geometric parameters of the spillage diffuser relevant to actual inlets. The results indicated that such a flow may be especially relevant if the terminal Mach number is about 1.3 to 1.4, the confinement parameter is around 10%, and the width is around twice or three times the height. In addition, the area expansion downstream of the shock should be limited to the conservative side of incipient stall based on incompressible diffusers. Copyright © 2013 by the authors.

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Pulses of 15 psec duration were generated by an injection laser with an external dispersive resonator operating in the active mode-locking regime. This regime was attained by subjecting the laser diode to a current of high frequency equal to the intermode interval in the external resonator. The duration of the pulses was determined by an autocorrelation method in which the second harmonic was generated in an LiIO//3 crystal.

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We report a versatile and cost-effective way of controlling the unsaturated loss, modulation depth and saturation fluence of graphene-based saturable absorbers (GSAs), by changing the thickness of a spacer between SLG and a high-reflection mirror. This allows us to modulate the electric field intensity enhancement at the GSA from 0 up to 400%, due to the interference of incident and reflected light at the mirror. The unsaturated loss of the SLG-mirror-assembly can be reduced to$\sim$0. We use this to mode-lock a VECSEL from 935 to 981nm. This approach can be applied to integrate SLG into various optical components, such as output coupler mirrors, dispersive mirrors, dielectric coatings on gain materials. Conversely, it can also be used to increase absorption (up to 10%) in various graphene based photonics and optoelectronics devices, such as photodetectors.