120 resultados para Plasma C4F8

Properties of amorphous carbon–silicon alloys deposited by a high plasma density source

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CVD diamond: a novel high γ-coating for plasma display panels?

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Dual ion plasma-beam sources used to maximise sp^3 C–C bonds in carbon nitride

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Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

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Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source

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Deposition of carbon nitride films using an electron cyclotron wave resonance plasma source

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High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

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Optical and electrical properties of a-C:H deposited by magnetic confinement of r.f. PECVD plasma

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Low-temperature anodic oxidation of silicon using a wave resonance plasma source

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Abrasive wear resistance of plasma-sprayed tungsten carbide-cobalt coatings

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Stability of electron emission current in hydrogen-free diamond-like carbon deposited by plasma enhanced chemical vapor deposition

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Relationship between field emission characteristics and hydrogen content in diamondlike carbon deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition

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Relationship between microstructure and erosive wear resistance of plasma sprayed alumina coatings

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Simulation of plasma flow in toroidal solenoid filters

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Interactions of the directed plasma from a cathodic arc with electrodes and magnetic fields

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