120 resultados para underdense plasma

Low-temperature plasma enhanced chemical vapour deposition of carbon nanotubes

Relevância:

20.00% 20.00%

Publicador:

Veja mais

The significance of plasma heating in carbon nanotube and nanofiber growth

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Gold-catalyzed growth of silicon nanowires by plasma enhanced chemical vapor deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Influence of inert gases on ionized magnetron plasma deposition of carbon nitride thin films

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Low temperature growth of carbon nanotubes by plasma-enhanced chemical vapour deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Plasma enhanced chemical vapour deposition carbon nanotubes/nanofibres — how uniform do they grow?

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Thermodynamic model of nucleation and growth of plasma deposited microcrystalline silicon

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Controlled low temperature growth of carbon nanofibres by plasma deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Carbon arc plasma transport through different off-plane double bend filters

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Characterisation of plasma-enhanced chemical vapour deposition carbon nanotubes by Auger electron spectroscopy

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Effect of focussed vacuum arc plasma deposition on the properties of tetrahedral amorphous carbon films

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Properties of amorphous carbon-silicon alloys deposited by a high plasma density source

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais