156 resultados para chemical attributes

Chemical and biological sensors using field effect devices

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Microcrystalline silicon thin film growth by electron cyclotron resonance chemical vapour deposition at 80°C for plastic application

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Microcrystalline silicon thin film growth by electron cyclotron resonance chemical vapour deposition at 80oC for plastic application

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Rationales for holonic manufacturing systems in chemical process industries

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Rapid production of a microreactor for the production of chemical synthesis

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Scanning tunneling microscopy study of the growth mechanism for hydrogenated amorphous Silicon produced by plasma enhanced chemical vapor deposition

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Chemical identification of metals in the STM by photon emission

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Chemical processes in the turbine and exhaust nozzle

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Preliminary studies of solidification and chemical fixation of liquid waste containing methylene blue

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Geotechnical properties of a clay contaminated with an organic chemical

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Direct numerical simulation of reversible and irreversible chemical reactions in turbulent nonpremixed flames

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Simulations of the dispersion of reactive pollutants in a street canyon, considering different chemical mechanisms and micromixing

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Plasma restructuring of catalysts for chemical vapor deposition of carbon nanotubes

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Surface-bound chemical vapour deposition of carbon nanotubes: in-situ study of catalyst activation

Relevância:

20.00% 20.00%

Publicador:

Veja mais

Modelling of delamination of ultra low-k material during chemical mechanical polishing

Relevância:

20.00% 20.00%

Publicador:

Veja mais