146 resultados para Plasma sputtering

Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors

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Spectroscopic studies of plume/plasma in different gas environments

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Thermodynamic model of the role of Hydrogen dilution in plasma deposition of microcrystalline silicon

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Amorphous carbon-silicon alloys prepared by a high plasma density source

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Characterisation of ionised magnetron sputtering plasmas for thin film deposition

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Scanning tunneling microscopy study of the growth mechanism for hydrogenated amorphous Silicon produced by plasma enhanced chemical vapor deposition

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High rate deposition of ta-C : H using an electron cyclotron wave resonance plasma source

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The microstructure of plasma deposited diamond-like carbon thin films

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Tribological properties of rf plasma deposited optically transparent diamond-like carbon films

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The effect of deposition conditions on the erosive wear resistance of plasma sprayed alumina coatings, vol. 1, 332-337

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Carbon-Silicon heterojunctions diodes formed by CH4/Ar rf plasma thin film deposition on Si substrates

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The resistance of plasma-sprayed alumina coatings to solid particle erosion.

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Improving sliding and abrasive wear behaviour of cast A356 and wrought AA7075 aluminium alloys by plasma electrolytic oxidation

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A multi-scale constitutive model for the sintering of an air-plasma-sprayed thermal barrier coating, and its response under hot isostatic pressing

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Plasma restructuring of catalysts for chemical vapor deposition of carbon nanotubes

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