93 resultados para ION-IMPLANTATION

Influence of ion energy and substrate temperature on the optical and electronic properties of tetrahedral amorphous carbon (ta-C) films

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Ion energy and plasma characterization in a silicon filtered cathodic vacuum arc

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Oxygen plasma reactive ion etching of tetrahedral amorphous carbon

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Properties of carbon ion deposited tetrahedral amorphous carbon film's as a function of ion energy

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The mechanism of ion conduction by Valinomycin: analysis of charge pulse responses

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Influence of carbon ion energy on properties of highly tetrahedral diamond-like carbon

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Properties of filtered-ion-beam-deposited diamondlike carbon as a function of ion energy

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Study of reactive ion etched nanometre size trenches using a combined scanning electron microscope and scanning tunnelling microscope

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Scanning tunnelling microscopy of ion etched Silicon

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Analysis of thin film composition using laser-induced ion mass analysis

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Nuclear quadrupole resonance and structure of the dichloride, HCl2 –ion

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Strongly adhering and thick highly tetrahedral amorphous carbon (ta-C) thin films via surface modification by implantation

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Ion transport mechanisms in a filtered cathodic vacuum arc (FCVA) system

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Simulating scanning ion conductance microscopy using a Monte Carlo approach

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Process control and melt depth homogenization for SiC-on-Si structures during flash lamp annealing by carbon implantation

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