Biblioteca Digital

91 resultados para double source electron beam evaporation technology

Electron-beam damage in scanning electron-microscopy of worn elastomer surfaces

Relevância:

100.00% 100.00%

Publicador:

Electron-beam damage in scanning electron-microscopy of worn elastomer surfaces

Relevância:

100.00% 100.00%

Publicador:

THE REACTION OF ION-BEAM MIXED TITANIUM LAYERS ON SILICON INDUCED BY ELECTRON-BEAM HEATING

Relevância:

100.00% 100.00%

Publicador:

CHARACTERIZATION OF RAPID ELECTRON-BEAM ANNEALED THIN TITANIUM SILICIDE FILMS

Relevância:

100.00% 100.00%

Publicador:

SCANNING-ELECTRON-BEAM ANNEALING OF ION-IMPLANTED P-N-JUNCTION DIODES

Relevância:

100.00% 100.00%

Publicador:

RAPID ELECTRON-BEAM INDUCED TANTALUM SILICON REACTIONS

Relevância:

100.00% 100.00%

Publicador:

RAPID ELECTRON-BEAM ISOTHERMAL PROCESSING OF ARSENIC-IMPLANTED NMOS DEVICES

Relevância:

100.00% 100.00%

Publicador:

IMPROVEMENT IN THE THICKNESS UNIFORMITY OF SILICON-ON-INSULATOR LAYERS FORMED BY DUAL ELECTRON-BEAM RECRYSTALLIZATION

Relevância:

100.00% 100.00%

Publicador:

TIME-RESOLVED REFLECTIVITY TECHNIQUES FOR DYNAMIC STUDIES OF ELECTRON-BEAM RECRYSTALLIZATION OF SILICON-ON-INSULATOR FILMS

Relevância:

100.00% 100.00%

Publicador:

PERFORMANCE OF CMOS DEVICES IN SILICON-ON-SAPPHIRE FILMS AFTER SOLID-PHASE EPITAXIAL-GROWTH WITH RAPID ELECTRON-BEAM HEATING

Relevância:

100.00% 100.00%

Publicador:

ELECTRON-BEAM ANNEALING OF ION-IMPLANTED SILICON

Relevância:

100.00% 100.00%

Publicador:

RAPID ELECTRON-BEAM ANNEALING OF TANTALUM FILMS ON SILICON

Relevância:

100.00% 100.00%

Publicador:

Mechanisms of elastodynamic erosion of electron-beam thermal barrier coatings

Relevância:

100.00% 100.00%

Publicador:

ELECTRON-BEAM PROCESSING FOR MOS DEVICES WITH SHALLOW JUNCTIONS

Relevância:

100.00% 100.00%

Publicador:

HIGHLY CONTROLLED DIFFUSION OF ION-IMPLANTED ARSENIC BY MULTIPLE SCAN ELECTRON-BEAM HEATING

Relevância:

100.00% 100.00%

Publicador:

«
1
2
3
4
5
6
7
»