Application of electron beams in thermal processing of semiconductor materials and devices

Rapid and effective thermal processing methods using electron beams are described in this paper. Heating times ranging from a fraction of a second to several seconds and temperatures up to 1400°C are attainable. Applications such as the annealing of ion implanted material, both without significant dopant diffusion and with highly controlled diffusion of impurities, are described. The technique has been used successfully to activate source/drain regions for fine geometry NMOS transistors. It is shown that electron beams can produce localised heating of semiconductor substrates and a resolution of approximately 1 μm has been achieved. Electron beam heating has been applied to improving the crystalline quality of silicon-on sapphire used in CMOS device fabrication. Silicon layers with defect levels approaching bulk material have been obtained. Finally, the combination of isothermal and selective annealing is shown to have application in recrystallisation of polysilicon films on an insulating layer. The approach provides the opportunity of producing a silicon-on-insulator substrate with improved crystalline quality compared to silicon-on-sapphire at a potentially lower cost. It is suggested that rapid heating methods are expected to provide a real alternative to conventional furnace processing of semiconductor devices in the development of fabrication technology. © 1984 Benn electronics Publications Ltd, Luton.

Expert system for prestressed concrete bridge design

The development of an expert system, BRIDEX, for the design of prestressed concrete bridges is discussed in this paper. Design of multi-span continuous pre-stressed concrete bridges pose considerable difficulties to designers because of the large number of parameters involved and their complex interactions. The design is often perceived as an iterative process of generation, evaluation and modification of trial designs. It takes years of experience to develop an understanding of the design process. BRIDEX is aimed at providing guidance to the designers by suggesting appropriate range of values for the design parameters. The knowledge within BRIDEX is mainly based on fundamental principles developed by a careful study of the intricacies involved in the design process, while heuristics are used only to supplement this knowledge. The BRIDEX approach ensures that the whole design evolves sequentially as the design proceeds, module after module.