Rapid electrohydrodynamic lithography using low-viscosity polymers.

This study explores a number of low-viscosity glass-forming polymers for their suitability as high-speed materials in electrohydrodynamic (EHD) lithography. The use of low-viscosity polymer films significantly reduces the patterning time (to below 10 s) compared to earlier approaches, without compromising the high fidelity of the replicated structures. The rapid pace of this process requires a method to monitor the completion of EHD pattern formation. To this end, the leakage current across the device is monitored and the sigmoidal shape of the current curve is correlated with the various stages of EHD pattern formation.

Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system

The development of the Nanolith parallel electron-beam writing head was discussed. The fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in the lithographic system were described. The microcathode exhibited a peak current of 10.5 μA at 48 V when operated with a duty cycle of 0.5 percent.

Improving speech transcription for Mandarin-english translation

This paper describes the development of the CU-HTK Mandarin Speech-To-Text (STT) system and assesses its performance as part of a transcription-translation pipeline which converts broadcast Mandarin audio into English text. Recent improvements to the STT system are described and these give Character Error Rate (CER) gains of 14.3% absolute for a Broadcast Conversation (BC) task and 5.1% absolute for a Broadcast News (BN) task. The output of these STT systems is then post-processed, so that it consists of sentence-like segments, and translated into English text using a Statistical Machine Translation (SMT) system. The performance of the transcription-translation pipeline is evaluated using the Translation Edit Rate (TER) and BLEU metrics. It is shown that improving both the STT system and the post-STT segmentations can lower the TER scores by up to 5.3% absolute and increase the BLEU scores by up to 2.7% absolute. © 2007 IEEE.

Fabrication of 25nm wide gold lines using nanometer scale lithography and ionized cluster beam deposition

It becomes increasingly difficult to make continuous metal lines with well defined thickness and edges by the lift-off technique as the line width is decreased. We describe in this paper a technique in which the combination of high resolution electron beam lithography and ionized cluster beam (ICB) deposition has enabled very high quality gold lines ({all equal to}25nm wide) to be obtained on thick single crystal silicon substrates. © 1990.