Linewidth influence in photonics logic device

Photonics logic devices are currently finding applications in most of the fields where optical signals are employed. These areas range from optical communications to optical computing, covering as well as other applications in photonics sensing and metrology. Most of the proposed configurations with photonics logic devices are based on semiconductor laser structures with “on/off” behaviors, operating in an optical amplifier configuration. They are able to offer non-linear gain or bistable operation, being these properties the basis for their applications in these fields. Moreover, their large number of potential affecting parameters onto their behavior offers the possibility to choose the best solution for each case.

Virtual Instruments in Dimensional Metrology

During the last five years, in order to improve understanding of content related to "Coordinate Metrology", the Laboratorio de Metrología y Metrotecnia (LMM) from the Polytechnic University of Madrid offers its PhD students, as a course work, the construction of a virtual instrument. This virtual instrument simulates the imaging of a part to be measured by optical dimensional metrology instruments (microscopes, profile projectors, vision machines). The LMM provides students with images similar to those they would obtain with real instrumentation for the instrument adjustment and calibration process. Working with these images, students should determine the adjustment parameters of the virtual instrument. Once these parameters are set, the student can perform the proper calibration of the virtual instrument. Beyond this process, the instrument is already able to perform traceable measurement. In order to do that, LMM offers students some images of parts. Students should perform some measurements using those images and estimate the corresponding uncertainties.

Uncertainty in ellipse fitting using a flatbed scanner: development and experimental verification

In the field of dimensional metrology, the use of optical measuring machines requires the handling of a large number of measurement points, or scanning points, taken from the image of the measurand. The presence of correlation between these measurement points has a significant influence on the uncertainty of the result. The aim of this work is the development of an estimation procedure for the uncertainty of measurement in a geometrically elliptical shape, taking into account the correlation between the scanning points. These points are obtained from an image produced using a commercial flat bed scanner. The characteristic parameters of the ellipse (coordinates of the center, semi-axes and the angle of the semi-major axis with regard to the horizontal) are determined using a least squares fit and orthogonal distance regression. The uncertainty is estimated using the information from the auto-correlation function of the residuals and is propagated through the fitting algorithm according to the rules described in Evaluation of Measurement Data—Supplement 2 to the ‘Guide to the Expression of Uncertainty in Measurement’—Extension to any number of output quantities. By introducing the concept of cut-off length, it can be observed how it is possible to take into account the presence of the correlation in the estimation of uncertainty in a very simple way while avoiding underestimation.

Uncertainty Estimation for Performance Evaluation of a Confocal Microscope as Metrology Equipment

Both in industry and research, the quality control of micrometric manufactured parts is based on the measurement of parameters whose traceability is sometimes difficult to guarantee. In some of these parts, the confocal microscopy shows great aptitudes to characterize a measurand qualitatively and quantitatively. The confocal microscopy allows the acquisition of 2D and 3D images that are easily manipulated. Nowadays, this equipment is manufactured by many different brands, each of them claiming a resolution probably not in accord to their real performance. The Laser Center (Technical University of Madrid) has a confocal microscope to verify the dimensions of the micro mechanizing in their own research projects. The present study pretends to confirm that the magnitudes obtained are true and reliable. To achieve this, a methodology for confocal microscope calibration is proposed, as well as an experimental phase for dimensionally valuing the equipment by 4 different standard positions, with its seven magnifications and the six objective lenses that the equipment currently has, in the x–y and z axis. From the results the uncertainty will be estimated along with an effect analysis of the different magnifications in each of the objective lenses.