3 resultados para Yb3 doping
em Universidad Politécnica de Madrid
Resumo:
The preparation of LiNbO3:Er3+/Yb3+ nanocrystals and their up-conversion properties have been studied. It is demonstrated that polyethyleneimine- (PEI) assisted dispersion procedures allow obtaining stable aqueous LiNbO3:Er3+/Yb3+ powder suspensions, with average size particles well below the micron range (100200 nm) and the isoelectric point of the suspension reaching values well above pH 7. After excitation of Yb3+ ions at a wavelength of 980 nm, the suspensions exhibit efficient, and stable, IR-to-visible (green and red) up-conversion properties, easily observed by the naked eye, very similar to those of the starting crystalline bulk material.
Resumo:
En el estudio histrico del dopaje en Espaa, conocer el papel de los medios de comunicacin escritos, como el diario deportivo Marca, resulta ser de gran relevancia. La funcin que el peridico ms vendido en Espaa ha desempeado a lo largo de los aos con relacin al deportista sospechoso, permite conocer de qu manera el discurso social se ha estructurado basndose precisamente en cmo sus cronistas han narrado el caso de dopaje.
Resumo:
The phosphosilicate glass (PSG), fabricated by tube furnace diffusion using a POCl3 source, is widely used as a dopant source in the manufacturing of crystalline silicon solar cells. Although it has been a widely addressed research topic for a long time, there is still lack of a comprehensive understanding of aspects such as the growth, the chemical composition, possible phosphorus depletion, the resulting in-diffused phosphorus profiles, the gettering behavior in silicon, and finally the metal-contact formation. This paper addresses these different aspects simultaneously to further optimize process conditions for photovoltaic applications. To do so, a wide range of experimental data is used and combined with device and process simulations, leading to a more comprehensive interpretation. The results show that slight changes in the PSG process conditions can produce high-quality emitters. It is predicted that PSG processes at 860C for 60min in combination with an etch-back and laser doping from PSG layer results in high-quality emitters with a peak dopant density Npeak=8.01018cm3 and a junction depth dj=0.4m, resulting in a sheet resistivitysh=380 /sq and a saturation current-density J0 below 10 fA/cm2. With these properties, the POCl3 process can compete with ion implantation or doped oxide approaches.