2 resultados para Optical instruments.
em Universidad Politécnica de Madrid
Resumo:
During the last five years, in order to improve understanding of content related to "Coordinate Metrology", the Laboratorio de Metrología y Metrotecnia (LMM) from the Polytechnic University of Madrid offers its PhD students, as a course work, the construction of a virtual instrument. This virtual instrument simulates the imaging of a part to be measured by optical dimensional metrology instruments (microscopes, profile projectors, vision machines). The LMM provides students with images similar to those they would obtain with real instrumentation for the instrument adjustment and calibration process. Working with these images, students should determine the adjustment parameters of the virtual instrument. Once these parameters are set, the student can perform the proper calibration of the virtual instrument. Beyond this process, the instrument is already able to perform traceable measurement. In order to do that, LMM offers students some images of parts. Students should perform some measurements using those images and estimate the corresponding uncertainties.
Resumo:
The damage induced on quartz (c-SiO2) by heavy ions (F, O, Br) at MeV energies, where electronic stopping is dominant, has been investigated by RBS/C and optical methods. The two techniques indicate the formation of amorphous layers with an isotropic refractive index (n = 1.475) at fluences around 1014 cm−2 that are associated to electronic mechanisms. The kinetics of the process can be described as the superposition of linear (possibly initial Poisson curve) and sigmoidal (Avrami-type) contributions. The coexistence of the two kinetic regimes may be associated to the differential roles of the amorphous track cores and preamorphous halos. By using ions and energies whose maximum stopping power lies inside the crystal (O at 13 MeV, F at 15 MeV and F at 30 MeV) buried amorphous layer are formed and optical waveguides at the sample surface have been generated.