Sparse Correlation Kernel Analysis and Reconstruction

This paper presents a new paradigm for signal reconstruction and superresolution, Correlation Kernel Analysis (CKA), that is based on the selection of a sparse set of bases from a large dictionary of class- specific basis functions. The basis functions that we use are the correlation functions of the class of signals we are analyzing. To choose the appropriate features from this large dictionary, we use Support Vector Machine (SVM) regression and compare this to traditional Principal Component Analysis (PCA) for the tasks of signal reconstruction, superresolution, and compression. The testbed we use in this paper is a set of images of pedestrians. This paper also presents results of experiments in which we use a dictionary of multiscale basis functions and then use Basis Pursuit De-Noising to obtain a sparse, multiscale approximation of a signal. The results are analyzed and we conclude that 1) when used with a sparse representation technique, the correlation function is an effective kernel for image reconstruction and superresolution, 2) for image compression, PCA and SVM have different tradeoffs, depending on the particular metric that is used to evaluate the results, 3) in sparse representation techniques, L_1 is not a good proxy for the true measure of sparsity, L_0, and 4) the L_epsilon norm may be a better error metric for image reconstruction and compression than the L_2 norm, though the exact psychophysical metric should take into account high order structure in images.

Two-dimensional Photonic Crystals Fabricated by Nanoimprint Lithography

We report on the process parameters of nanoimprint lithography (NIL) for the fabrication of two-dimensional (2-D) photonic crystals. The nickel mould with 2-D photonic crystal patterns covering the area up to 20mm² is produced by electron-beam lithography (EBL) and electroplating. Periodic pillars as high as 200nm to 250nm are produced on the mould with the diameters ranging from 180nm to 400nm. The mould is employed for nanoimprinting on the poly-methyl-methacrylate (PMMA) layer spin-coated on the silicon substrate. Periodic air holes are formed in PMMA above its glass-transition temperature and the patterns on the mould are well transferred. This nanometer-size structure provided by NIL is subjective to further pattern transfer.