1 resultado para mould
em Massachusetts Institute of Technology
Filtro por publicador
- Academic Research Repository at Institute of Developing Economies (1)
- Acceda, el repositorio institucional de la Universidad de Las Palmas de Gran Canaria. España (1)
- AMS Tesi di Dottorato - Alm@DL - Università di Bologna (4)
- Aquatic Commons (9)
- ArchiMeD - Elektronische Publikationen der Universität Mainz - Alemanha (1)
- Archive of European Integration (2)
- Archivo Digital para la Docencia y la Investigación - Repositorio Institucional de la Universidad del País Vasco (3)
- Aston University Research Archive (14)
- Biblioteca de Teses e Dissertações da USP (1)
- Biblioteca Digital | Sistema Integrado de Documentación | UNCuyo - UNCUYO. UNIVERSIDAD NACIONAL DE CUYO. (1)
- Biblioteca Digital da Produção Intelectual da Universidade de São Paulo (2)
- Biblioteca Digital da Produção Intelectual da Universidade de São Paulo (BDPI/USP) (5)
- Biblioteca Digital de Teses e Dissertações Eletrônicas da UERJ (3)
- BORIS: Bern Open Repository and Information System - Berna - Suiça (13)
- Brock University, Canada (4)
- Cambridge University Engineering Department Publications Database (1)
- CentAUR: Central Archive University of Reading - UK (53)
- Chinese Academy of Sciences Institutional Repositories Grid Portal (22)
- Cochin University of Science & Technology (CUSAT), India (2)
- Comissão Econômica para a América Latina e o Caribe (CEPAL) (1)
- CORA - Cork Open Research Archive - University College Cork - Ireland (3)
- Dalarna University College Electronic Archive (2)
- Deakin Research Online - Australia (11)
- Digital Peer Publishing (1)
- eResearch Archive - Queensland Department of Agriculture; Fisheries and Forestry (11)
- Greenwich Academic Literature Archive - UK (12)
- Helda - Digital Repository of University of Helsinki (6)
- Indian Institute of Science - Bangalore - Índia (31)
- Instituto Politécnico de Leiria (1)
- Instituto Politécnico do Porto, Portugal (4)
- Massachusetts Institute of Technology (1)
- Publishing Network for Geoscientific & Environmental Data (1)
- QSpace: Queen's University - Canada (1)
- QUB Research Portal - Research Directory and Institutional Repository for Queen's University Belfast (38)
- Queensland University of Technology - ePrints Archive (24)
- ReCiL - Repositório Científico Lusófona - Grupo Lusófona, Portugal (1)
- Repositório Científico do Instituto Politécnico de Lisboa - Portugal (1)
- Repositório digital da Fundação Getúlio Vargas - FGV (3)
- Repositório Institucional da Universidade de Aveiro - Portugal (1)
- Repositório Institucional da Universidade de Brasília (1)
- Repositorio Institucional de la Universidad de Málaga (1)
- Repositório Institucional UNESP - Universidade Estadual Paulista "Julio de Mesquita Filho" (35)
- Research Open Access Repository of the University of East London. (3)
- RUN (Repositório da Universidade Nova de Lisboa) - FCT (Faculdade de Cienecias e Technologia), Universidade Nova de Lisboa (UNL), Portugal (1)
- SAPIENTIA - Universidade do Algarve - Portugal (2)
- Universidad de Alicante (1)
- Universidad del Rosario, Colombia (2)
- Universidad Politécnica de Madrid (3)
- Universidade de Lisboa - Repositório Aberto (1)
- Universidade Federal do Pará (2)
- Universidade Federal do Rio Grande do Norte (UFRN) (4)
- Universitat de Girona, Spain (2)
- Universitätsbibliothek Kassel, Universität Kassel, Germany (1)
- Université de Montréal (1)
- Université de Montréal, Canada (1)
- Université Laval Mémoires et thèses électroniques (1)
- University of Michigan (11)
- University of Queensland eSpace - Australia (13)
- Worcester Research and Publications - Worcester Research and Publications - UK (1)
Resumo:
We report on the process parameters of nanoimprint lithography (NIL) for the fabrication of two-dimensional (2-D) photonic crystals. The nickel mould with 2-D photonic crystal patterns covering the area up to 20mm² is produced by electron-beam lithography (EBL) and electroplating. Periodic pillars as high as 200nm to 250nm are produced on the mould with the diameters ranging from 180nm to 400nm. The mould is employed for nanoimprinting on the poly-methyl-methacrylate (PMMA) layer spin-coated on the silicon substrate. Periodic air holes are formed in PMMA above its glass-transition temperature and the patterns on the mould are well transferred. This nanometer-size structure provided by NIL is subjective to further pattern transfer.