Presentation Based User Interface

A prototype presentation system base is described. It offers mechanisms, tools, and ready-made parts for building user interfaces. A general user interface model underlies the base, organized around the concept of a presentation: a visible text or graphic for conveying information. Te base and model emphasize domain independence and style independence, to apply to the widest possible range of interfaces. The primitive presentation system model treats the interface as a system of processes maintaining a semantic relation between an application data base and a presentation data base, the symbolic screen description containing presentations. A presenter continually updates the presentation data base from the application data base. The user manipulates presentations with a presentation editor. A recognizer translates the user's presentation manipulation into application data base commands. The primitive presentation system can be extended to model more complex systems by attaching additional presentation systems. In order to illustrate the model's generality and descriptive capabilities, extended model structures for several existing user interfaces are discussed. The base provides support for building the application and presentation data bases, linked together into a single, uniform network, including descriptions of classes of objects as we as the objects themselves. The base provides an initial presentation data base network graphics to continually display it, and editing functions. A variety of tools and mechanisms help create and control presenters and recognizers. To demonstrate the base's utility, three interfaces to an operating system were constructed, embodying different styles: icons, menu, and graphical annotation.

A Parallel Processing Model of Musical Structures

Euterpe is a real-time computer system for the modeling of musical structures. It provides a formalism wherein familiar concepts of musical analysis may be readily expressed. This is verified by its application to the analysis of a wide variety of conventional forms of music: Gregorian chant, Mediaeval polyphony, Back counterpoint, and sonata form. It may be of further assistance in the real-time experiments in various techniques of thematic development. Finally, the system is endowed with sound-synthesis apparatus with which the user may prepare tapes for musical performances.

AMAR: A Computational Model of Autosegmental Phonology

This report describes a computational system with which phonologists may describe a natural language in terms of autosegmental phonology, currently the most advanced theory pertaining to the sound systems of human languages. This system allows linguists to easily test autosegmental hypotheses against a large corpus of data. The system was designed primarily with tonal systems in mind, but also provides support for tree or feature matrix representation of phonemes (as in The Sound Pattern of English), as well as syllable structures and other aspects of phonological theory. Underspecification is allowed, and trees may be specified before, during, and after rule application. The association convention is automatically applied, and other principles such as the conjunctivity condition are supported. The method of representation was designed such that rules are designated in as close a fashion as possible to the existing conventions of autosegmental theory while adhering to a textual constraint for maximum portability.

Object Recognition with Pictorial Structures

This thesis presents a statistical framework for object recognition. The framework is motivated by the pictorial structure models introduced by Fischler and Elschlager nearly 30 years ago. The basic idea is to model an object by a collection of parts arranged in a deformable configuration. The appearance of each part is modeled separately, and the deformable configuration is represented by spring-like connections between pairs of parts. These models allow for qualitative descriptions of visual appearance, and are suitable for generic recognition problems. The problem of detecting an object in an image and the problem of learning an object model using training examples are naturally formulated under a statistical approach. We present efficient algorithms to solve these problems in our framework. We demonstrate our techniques by training models to represent faces and human bodies. The models are then used to locate the corresponding objects in novel images.

A Multi-scale Model for Copper Dishing in Chemical-Mechanical Polishing

The present success in the manufacture of multi-layer interconnects in ultra-large-scale integration is largely due to the acceptable planarization capabilities of the chemical-mechanical polishing (CMP) process. In the past decade, copper has emerged as the preferred interconnect material. The greatest challenge in Cu CMP at present is the control of wafer surface non-uniformity at various scales. As the size of a wafer has increased to 300 mm, the wafer-level non-uniformity has assumed critical importance. Moreover, the pattern geometry in each die has become quite complex due to a wide range of feature sizes and multi-level structures. Therefore, it is important to develop a non-uniformity model that integrates wafer-, die- and feature-level variations into a unified, multi-scale dielectric erosion and Cu dishing model. In this paper, a systematic way of characterizing and modeling dishing in the single-step Cu CMP process is presented. The possible causes of dishing at each scale are identified in terms of several geometric and process parameters. The feature-scale pressure calculation based on the step-height at each polishing stage is introduced. The dishing model is based on pad elastic deformation and the evolving pattern geometry, and is integrated with the wafer- and die-level variations. Experimental and analytical means of determining the model parameters are outlined and the model is validated by polishing experiments on patterned wafers. Finally, practical approaches for minimizing Cu dishing are suggested.

A Multi-scale Model for Copper Dishing in Chemical-Mechanical Polishing

The present success in the manufacture of multi-layer interconnects in ultra-large-scale integration is largely due to the acceptable planarization capabilities of the chemical-mechanical polishing (CMP) process. In the past decade, copper has emerged as the preferred interconnect material. The greatest challenge in Cu CMP at present is the control of wafer surface non-uniformity at various scales. As the size of a wafer has increased to 300 mm, the wafer-level non-uniformity has assumed critical importance. Moreover, the pattern geometry in each die has become quite complex due to a wide range of feature sizes and multi-level structures. Therefore, it is important to develop a non-uniformity model that integrates wafer-, die- and feature-level variations into a unified, multi-scale dielectric erosion and Cu dishing model. In this paper, a systematic way of characterizing and modeling dishing in the single-step Cu CMP process is presented. The possible causes of dishing at each scale are identified in terms of several geometric and process parameters. The feature-scale pressure calculation based on the step-height at each polishing stage is introduced. The dishing model is based on pad elastic deformation and the evolving pattern geometry, and is integrated with the wafer- and die-level variations. Experimental and analytical means of determining the model parameters are outlined and the model is validated by polishing experiments on patterned wafers. Finally, practical approaches for minimizing Cu dishing are suggested.