4 resultados para Coarse-to-fine processing
em Massachusetts Institute of Technology
Resumo:
Freehand sketching is both a natural and crucial part of design, yet is unsupported by current design automation software. We are working to combine the flexibility and ease of use of paper and pencil with the processing power of a computer to produce a design environment that feels as natural as paper, yet is considerably smarter. One of the most basic steps in accomplishing this is converting the original digitized pen strokes in the sketch into the intended geometric objects using feature point detection and approximation. We demonstrate how multiple sources of information can be combined for feature detection in strokes and apply this technique using two approaches to signal processing, one using simple average based thresholding and a second using scale space.
Resumo:
We investigate the properties of feedforward neural networks trained with Hebbian learning algorithms. A new unsupervised algorithm is proposed which produces statistically uncorrelated outputs. The algorithm causes the weights of the network to converge to the eigenvectors of the input correlation with largest eigenvalues. The algorithm is closely related to the technique of Self-supervised Backpropagation, as well as other algorithms for unsupervised learning. Applications of the algorithm to texture processing, image coding, and stereo depth edge detection are given. We show that the algorithm can lead to the development of filters qualitatively similar to those found in primate visual cortex.
Resumo:
Surface (Lambertain) color is a useful visual cue for analyzing material composition of scenes. This thesis adopts a signal processing approach to color vision. It represents color images as fields of 3D vectors, from which we extract region and boundary information. The first problem we face is one of secondary imaging effects that makes image color different from surface color. We demonstrate a simple but effective polarization based technique that corrects for these effects. We then propose a systematic approach of scalarizing color, that allows us to augment classical image processing tools and concepts for multi-dimensional color signals.
Resumo:
Holes with different sizes from microscale to nanoscale were directly fabricated by focused ion beam (FIB) milling in this paper. Maximum aspect ratio of the fabricated holes can be 5:1 for the hole with large size with pure FIB milling, 10:1 for gas assistant etching, and 1:1 for the hole with size below 100 nm. A phenomenon of volume swell at the boundary of the hole was observed. The reason maybe due to the dose dependence of the effective sputter yield in low intensity Gaussian beam tail regions and redeposition. Different materials were used to investigate variation of the aspect ratio. The results show that for some special material, such as Ni-Be, the corresponding aspect ratio can reach 13.8:1 with Cl₂ assistant etching, but only 0.09:1 for Si(100) with single scan of the FIB.