Continuous low vacuum coating apparatus


Autoria(s): Hurren, Christopher; Conolly, Brian John; Hussey, Thomas Kenneth
Data(s)

22/08/2013

Resumo

An apparatus for continuously forming a thin-film layer of organic or inorganic functional material on one or both sides of a flexible substrate via plasma enhanced vacuum vapour deposition.

Identificador

http://hdl.handle.net/10536/DRO/DU:30069927

Idioma(s)

eng

Publicador

Zhik Pty. Ltd.

Relação

http://dro.deakin.edu.au/eserv/DU:30069927/hurren-continuouslow-2013.pdf

http://www.google.com/patents/US20130216728

Direitos

2013, Zhik Pty. Ltd.

Tipo

Patent