Design and fabrication of an electrode for low-actuation-voltage electrowetting-on-dielectric devices


Autoria(s): Samad, M.F.; Kouzani, A.Z.; Rahman, M.M.; Magniez, K.; Kaynak, A.
Data(s)

01/01/2015

Resumo

This paper presents the design and fabrication of an electrode for low-actuation-voltage electrowetting-on-dielectric (EWOD) devices. The electrode which takes advantage of a novel shape is used to develop an EWOD device. The fabrication process for the electrode and the device development includes laser exposure, wet developing, etching, and stripping. A dielectric layer of 5% (wt./wt.) Polyvinylidene difluoride (PVDF) is used for the electrode insulation. In addition, a very thin (50 nm) layer of Teflon is coated on the EWOD surface to provide hydrophobicity. It is observed that a thin and high dielectric-constant layer can reduce the actuation voltage in the EWOD device. An actuation voltage of 14.8 V was achieved by the EWOD device.

Identificador

http://hdl.handle.net/10536/DRO/DU:30082759

Idioma(s)

eng

Publicador

Elsevier

Relação

http://dro.deakin.edu.au/eserv/DU:30082759/samad-designandfabrication-2015.pdf

http://dro.deakin.edu.au/eserv/DU:30082759/samad-designandfabrication-evid-2015.pdf

http://www.dx.doi.org/10.1016/j.protcy.2015.07.005

Direitos

2015, Elsevier

Palavras-Chave #Electrowetting on dielectic (EWOD) #Electrode #Actuation voltage #Photolithography #Dielectric layer #Hydrophobic layer
Tipo

Journal Article