Design and fabrication of an electrode for low-actuation-voltage electrowetting-on-dielectric devices
Data(s) |
01/01/2015
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Resumo |
This paper presents the design and fabrication of an electrode for low-actuation-voltage electrowetting-on-dielectric (EWOD) devices. The electrode which takes advantage of a novel shape is used to develop an EWOD device. The fabrication process for the electrode and the device development includes laser exposure, wet developing, etching, and stripping. A dielectric layer of 5% (wt./wt.) Polyvinylidene difluoride (PVDF) is used for the electrode insulation. In addition, a very thin (50 nm) layer of Teflon is coated on the EWOD surface to provide hydrophobicity. It is observed that a thin and high dielectric-constant layer can reduce the actuation voltage in the EWOD device. An actuation voltage of 14.8 V was achieved by the EWOD device. |
Identificador | |
Idioma(s) |
eng |
Publicador |
Elsevier |
Relação |
http://dro.deakin.edu.au/eserv/DU:30082759/samad-designandfabrication-2015.pdf http://dro.deakin.edu.au/eserv/DU:30082759/samad-designandfabrication-evid-2015.pdf http://www.dx.doi.org/10.1016/j.protcy.2015.07.005 |
Direitos |
2015, Elsevier |
Palavras-Chave | #Electrowetting on dielectic (EWOD) #Electrode #Actuation voltage #Photolithography #Dielectric layer #Hydrophobic layer |
Tipo |
Journal Article |