Differences between thin films deposition systems in the production transition metal nitride
| Contribuinte(s) |
Materiales Nanoestructurados y Biomodelación, Universidad de Medellín, Medellín, Colombia Laboratorio de Superconductividad y Nuevos Materiales, Universidad Nacional de Colombia, Bogotá, Colombia Laboratorio de Física Del Plasma, Universidad Nacional de Colombia, Manizales, Colombia |
|---|---|
| Data(s) |
2013
23/06/2016
23/06/2016
|
| Identificador |
17426588 http://hdl.handle.net/11407/2286 10.1088/1742-6596/466/1/012002 |
| Idioma(s) |
eng |
| Relação |
Journal of Physics: Conference Series Volume 466, Issue 1, 2013, Article number 012002 http://iopscience.iop.org/article/10.1088/1742-6596/466/1/012002/meta |
| Direitos |
info:eu-repo/semantics/restrictedAccess restrictedAccess |
| Fonte |
Scopus |
| Palavras-Chave | #Direct observations #Gold nitride #Ionic implantation #Optimum properties #Production transition #Pulsed arc #Reactive ion #Thin films deposition #Binding energy #Coatings #Gold #Ion implantation #Nitrides #Physical vapor deposition #Thin films #Vacuum technology #Deposition |
| Tipo |
info:eu-repo/semantics/conferenceObject Conference Paper |
