Optical emission of strained direct-band-gap Ge quantum well embedded inside InGaAs alloy layers


Autoria(s): Pavarelli, Nicola; Ochalski, Tomasz J.; Murphy-Armando, Felipe; Huo, Y.; Schmidt, Michael; Huyet, Guillaume; Harris, J. S.
Data(s)

23/05/2016

23/05/2016

25/04/2013

20/08/2015

Resumo

We studied the optical properties of a strain-induced direct-band-gap Ge quantum well embedded in InGaAs. We showed that the band offsets depend on the electronegativity of the layer in contact with Ge, leading to different types of optical transitions in the heterostructure. When group-V atoms compose the interfaces, only electrons are confined in Ge, whereas both carriers are confined when the interface consists of group-III atoms. The different carrier confinement results in different emission dynamics behavior. This study provides a solution to obtain efficient light emission from Ge.

Formato

application/pdf

Identificador

Pavarelli, N., Ochalski, T. J., Murphy-Armando, F., Huo, Y., Schmidt, M., Huyet, G. & Harris, J. S. (2013) ‘Optical Emission of a Strained Direct-Band-Gap Ge Quantum Well Embedded Inside InGaAs Alloy Layers’, Physical Review Letters, 110, 177404. http://dx.doi.org/10.1103/PhysRevLett.110.177404

110

177404 (1)

177404 (5)

0031-9007

1079-7114

http://hdl.handle.net/10468/2602

10.1103/PhysRevLett.110.177404

Physical Review Letters

177404

Idioma(s)

en

Publicador

American Physical Society

Relação

http://link.aps.org/doi/10.1103/PhysRevLett.110.177404

Direitos

© 2013 American Physical Society

Palavras-Chave #Germanium #Band offsets #Carrier confinements #Emission dynamics #InGaAs alloys #Optical emissions #Ge quantum well
Tipo

Article (peer-reviewed)