Optical emission of strained direct-band-gap Ge quantum well embedded inside InGaAs alloy layers
Data(s) |
23/05/2016
23/05/2016
25/04/2013
20/08/2015
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Resumo |
We studied the optical properties of a strain-induced direct-band-gap Ge quantum well embedded in InGaAs. We showed that the band offsets depend on the electronegativity of the layer in contact with Ge, leading to different types of optical transitions in the heterostructure. When group-V atoms compose the interfaces, only electrons are confined in Ge, whereas both carriers are confined when the interface consists of group-III atoms. The different carrier confinement results in different emission dynamics behavior. This study provides a solution to obtain efficient light emission from Ge. |
Formato |
application/pdf |
Identificador |
Pavarelli, N., Ochalski, T. J., Murphy-Armando, F., Huo, Y., Schmidt, M., Huyet, G. & Harris, J. S. (2013) ‘Optical Emission of a Strained Direct-Band-Gap Ge Quantum Well Embedded Inside InGaAs Alloy Layers’, Physical Review Letters, 110, 177404. http://dx.doi.org/10.1103/PhysRevLett.110.177404 110 177404 (1) 177404 (5) 0031-9007 1079-7114 http://hdl.handle.net/10468/2602 10.1103/PhysRevLett.110.177404 Physical Review Letters 177404 |
Idioma(s) |
en |
Publicador |
American Physical Society |
Relação |
http://link.aps.org/doi/10.1103/PhysRevLett.110.177404 |
Direitos |
© 2013 American Physical Society |
Palavras-Chave | #Germanium #Band offsets #Carrier confinements #Emission dynamics #InGaAs alloys #Optical emissions #Ge quantum well |
Tipo |
Article (peer-reviewed) |