The structural and piezoresponse properties of c-axis-oriented Aurivillius phase Bi5Ti3FeO15 thin films deposited by atomic vapor deposition


Autoria(s): Zhang, Panfeng F.; Deepak, Nitin; Keeney, Lynette; Pemble, Martyn E.; Whatmore, Roger W.
Data(s)

22/07/2016

22/07/2016

11/09/2012

03/09/2014

Resumo

The deposition by atomic vapor deposition of highly c-axis-oriented Aurivillius phase Bi 5Ti 3FeO 15 (BTFO) thin films on (100) Si substrates is reported. Partially crystallized BTFO films with c-axis perpendicular to the substrate surface were first deposited at 610°C (8 excess Bi), and subsequently annealed at 820°C to get stoichiometric composition. After annealing, the films were highly c-axis-oriented, showing only (00l) peaks in x-ray diffraction (XRD), up to (0024). Transmission electron microscopy (TEM) confirms the BTFO film has a clear layered structure, and the bismuth oxide layer interleaves the four-block pseudoperovskite layer, indicating the n 4 Aurivillius phase structure. Piezoresponse force microscopy measurements indicate strong in-plane piezoelectric response, consistent with the c-axis layered structure, shown by XRD and TEM.

Formato

application/pdf

Identificador

Zhang, P. F., Deepak, N., Keeney, L., Pemble, M. E. and Whatmore, R. W. (2012) 'The structural and piezoresponse properties of c-axis-oriented Aurivillius phase Bi5Ti3FeO15 thin films deposited by atomic vapor deposition'. Applied Physics Letters, 101, 112903. http://scitation.aip.org/content/aip/journal/apl/101/11/10.1063/1.4752007

101

112903-1

112903-4

0003-6951

1077-3118

http://hdl.handle.net/10468/2933

10.1063/1.4752007

Applied Physics Letters

112903

Idioma(s)

en

Publicador

AIP Publishing

Direitos

© 2012 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Appl. Phys. Lett. 101, 112903 (2012) and may be found at http://scitation.aip.org/content/aip/journal/apl/101/11/10.1063/1.4752007

Palavras-Chave #Thin film structure #Thin films #Annealing #Liquid thin films #X-ray diffraction #Bi 5Ti 3FeO 15 #Bismuth titanate #Transmission electron microscopy #Atomic vapor deposition
Tipo

Article (peer-reviewed)