Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm


Autoria(s): Sáez Rodríguez, D.; Nielsen, K.; Bang, O.; Webb, D.J.
Contribuinte(s)

Kalli, Kyriacos

Mendez, Alexis

Data(s)

2014

Resumo

In this paper we report, for the first time to our knowledge, an increase of the photosensitivity of a microstructured polymer optical fibre (mPOF) made of undoped PMMA due to applied strain during the fabrication of the gratings. In the work, fibre Bragg gratings (FBGs) have been fabricated in undoped PMMA mPOFs with a hexagonal structure of three rings in the inner cladding. Two sets of FBGs were inscribed at two different resonant wavelengths (827 nm and 1562 nm) at different strains using an UV He-Cd laser at 325 nm focused by a lens and scanned over the fibre. We observed an increase of the reflection of the fibre Bragg gratings when the fabrication strain is higher. The photosensitivity mechanism is discussed in the paper along with the chemical reactions that could underlie the mechanism. Furthermore, the resolution limit of the material was investigated. © 2014 Copyright SPIE.

Formato

application/pdf

Identificador

http://eprints.aston.ac.uk/22975/1/Increase_of_the_photosensitivity_of_undoped_poly_methylmethacrylate_.pdf

Sáez Rodríguez, D.; Nielsen, K.; Bang, O. and Webb, D.J. (2014). Increase of the photosensitivity of undoped poly(methylmethacrylate) under UV radiation at 325 nm. IN: Micro-structured and specialty optical fibres III. Kalli, Kyriacos and Mendez, Alexis (eds) SPIE proceedings . Washington (US): SPIE.

Publicador

SPIE

Relação

http://eprints.aston.ac.uk/22975/

Tipo

Book Section

NonPeerReviewed