Automated photomask inspection /


Autoria(s): Novotny, Donald B.; Ciarlo, Dino R., joint author.; United States. National Bureau of Standards. Special publication.
Data(s)

29/12/1978

Resumo

Includes bibliographical references.

Mode of access: Internet.

Formato

bib

bib

bib

Identificador

http://hdl.handle.net/2027/mdp.39015077586454

http://hdl.handle.net/2027/uiug.30112104064347

http://hdl.handle.net/2027/uc1.31210023555657

Idioma(s)

eng

Publicador

Washington, D.C. : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off.,

Direitos

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Palavras-Chave #Optical instruments. #Integrated circuits
Tipo

text