Angular sensitivity of controlled implanted doping profiles /
Data(s) |
16/11/1978
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Resumo |
Includes bibliographical references. Mode of access: Internet. |
Formato |
bib bib bib |
Identificador |
http://hdl.handle.net/2027/uiug.30112104076622 |
Idioma(s) |
eng |
Publicador |
[Washington] : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Doc., U.S. Govt. Print. Off., |
Relação |
Angular sensitivity of controlled implanted doping profiles. |
Direitos |
Items in this record are available as Public Domain, Google-digitized. View access and use profile at http://www.hathitrust.org/access_use#pd-google. Please see individual items for rights and use statements. |
Palavras-Chave | #Integrated circuits. #Ion implantation. #Semiconductor doping. |
Tipo |
text |