Angular sensitivity of controlled implanted doping profiles /


Autoria(s): Wilson, Robert G.
Data(s)

16/11/1978

Resumo

Includes bibliographical references.

Mode of access: Internet.

Formato

bib

bib

bib

Identificador

http://hdl.handle.net/2027/uiug.30112104076622

http://hdl.handle.net/2027/mdp.39015077586363

http://hdl.handle.net/2027/uc1.31210023555632

Idioma(s)

eng

Publicador

[Washington] : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Doc., U.S. Govt. Print. Off.,

Relação

Angular sensitivity of controlled implanted doping profiles.

Direitos

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Palavras-Chave #Integrated circuits. #Ion implantation. #Semiconductor doping.
Tipo

text