A production-compatible microelectronic test pattern for evaluating photomask misalignment /
| Data(s) |
06/01/1979
|
|---|---|
| Resumo |
Includes bibliographical references. Mode of access: Internet. |
| Formato |
bib bib bib |
| Identificador |
http://hdl.handle.net/2027/uiug.30112104076648 |
| Idioma(s) |
eng |
| Publicador |
Washington : U. S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U. S. Govt. Print. Off., |
| Direitos |
Items in this record are available as Public Domain, Google-digitized. View access and use profile at http://www.hathitrust.org/access_use#pd-google. Please see individual items for rights and use statements. |
| Palavras-Chave | #Integrated circuits |
| Tipo |
text |
