Accurate linewidth measurements on integrated-circuit photomasks /

Autoria(s): Jerke, John M.; United States. National Bureau of Standards. Special publication.; United States. Defense Advanced Research Projects Agency.; Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division.
Data(s)

14/11/1980
Resumo

"Supported by the Defense Advanced Research Projects Agency ... and the National Bureau of Standards."

"Issued February 1980."

Includes bibliographical references.

Mode of access: Internet.
Formato

bib

bib
Identificador

http://hdl.handle.net/2027/mdp.39015077585241

http://hdl.handle.net/2027/uc1.31210023555673

URN:ISBN:
Idioma(s)

eng
Publicador

Washington, D.C. : U.S. Dept. of Commerce, National Bureau of Standards : U.S. Govt. Print. Off. : For sale by the Supt. of Docs., U.S. Govt. Print. Off.,
Direitos

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Palavras-Chave #Integrated circuits
Tipo

text
Acesso ao item digital