Tailoring the magnetic anisotropy and domain patterns of sputtered TbFeGa alloys

We report the magnetic anisotropy and domain configuration of cosputtered TbFeGa alloys. The layers were deposited from two targets with compositions TbFe2 and Fe3Ga, respectively. The structural and magnetic properties do not only depend on the composition but also on the growth conditions. Alloys with the same composition but deposited using a DC or a pulsed power source in the TbFe2 target exhibit a different magnetic anisotropy. The perpendicular magnetic anisotropy, the size and topology of domain patterns can be tailored by changing the evaporation parameters of TbFe2. The width of the stripe domain increases from 235 to 835 nm when using the DC source in the TbFe2. We correlate this effect with Tb enrichment of the TbxFe1−x phases present in the samples.