Study of the temperature distribution in Si nanowires under microscopic laser beam excitation

Autoria(s): Rodriguez Rodriguez, Antonio; Rodriguez Dominguez, Andres; Rodriguez Rodriguez, Tomas; Anaya Velay, J.; Torres, A.; Martin-, A.; Souto, J.; Jimenez, J.
Data(s)

2013
Resumo

Study of the temperature distribution in Si nanowires under microscopic laser beam excitation
Formato

application/pdf
Identificador

http://oa.upm.es/29462/
Idioma(s)

spa
Publicador

E.T.S. Arquitectura (UPM)
Relação

http://oa.upm.es/29462/1/appphys_retocadoopt.pdf

info:eu-repo/semantics/altIdentifier/doi/10.1007/s00339-012-7509-y
Direitos

http://creativecommons.org/licenses/by-nc-nd/3.0/es/

info:eu-repo/semantics/openAccess
Fonte

Applied physics A - Materials science & Processing, ISSN 0947-8396, 2013, Vol. 113, No. 1
Palavras-Chave #Ingeniería Civil y de la Construcción
Tipo

info:eu-repo/semantics/article

Artículo

PeerReviewed
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