Structural and morphological studies on wet-etched InAlGaN barrier HEMT structures


Autoria(s): Brazzini, Tommaso; Tadjer, Marko Jak; Gacevic, Zarko; Pandey, Saurabh; Cavallini, Anna; Behmenburg, H.; Giesen, C.; Heuken, M.; Calle Gómez, Fernando
Data(s)

2012

Resumo

The quaternary nitride-based high electron mobility transistor (HEMT) has been recently a focus of interest because of the possibility to grow lattice-matched barrier to GaN and tune the barrier bandgap at the same time.

Formato

application/pdf

Identificador

http://oa.upm.es/22887/

Idioma(s)

eng

Publicador

E.T.S.I. Telecomunicación (UPM)

Relação

http://oa.upm.es/22887/1/INVE_MEM_2012_153316.pdf

info:eu-repo/semantics/altIdentifier/doi/null

Direitos

http://creativecommons.org/licenses/by-nc-nd/3.0/es/

info:eu-repo/semantics/openAccess

Fonte

International Workshop on Nitride Semiconductors (IWN2012) | International Workshop on Nitride Semiconductors (IWN2012) | 14/10/2012 - 19/10/2012 | Sapporo, Japan

Palavras-Chave #Electrónica
Tipo

info:eu-repo/semantics/conferenceObject

Ponencia en Congreso o Jornada

PeerReviewed