Ion Beam irradiation of copper nitride: electronic vs elastic-collision mechanism
Data(s) |
2011
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Resumo |
Copper nitride is a metastable material which results very attractive because of their potential to be used in functional device. Cu3 N easily decomposes into Cu and N2 by annealing [1] or irradiation (electron, ions, laser) [2, 3]. Previous studies carried out in N-rich Cu3 N films irradiated with Cu at 42MeV evidence a very efficient sputtering of N whose yield (5×10 3 atom/ion), for a film with a thickness of just 100 nm, suggest that the origin of the sputtering has an electronic nature. This N depletion was observed to be responsible for new phase formation ( Cu2 O) and pure Cu [4] |
Formato |
application/pdf |
Identificador | |
Idioma(s) |
eng |
Publicador |
E.T.S.I. Industriales (UPM) |
Relação |
http://oa.upm.es/12501/1/INVE_MEM_2011_105370.pdf http://www.iba2011.org/site/tiki-index.php |
Direitos |
http://creativecommons.org/licenses/by-nc-nd/3.0/es/ info:eu-repo/semantics/openAccess |
Fonte |
Proceedings of 20th International Conference on Ion Beam Analysis, IBA | 20th International Conference on Ion Beam Analysis, IBA | 10/04/2011 - 15/04/2011 | Itapema, Brasil |
Palavras-Chave | #Energía Nuclear #Física |
Tipo |
info:eu-repo/semantics/conferenceObject Ponencia en Congreso o Jornada PeerReviewed |