The incomplete ionization of substitutional dopants in Silicon Carbide


Autoria(s): Scaburri, Raffaele <1974>
Contribuinte(s)

Bignozzi, Maria

Data(s)

25/05/2011

Resumo

This thesis analyzes theoretically and computationally the phenomenon of partial ionization of the substitutional dopants in Silicon Carbide at thermal equilibrium. It is based on the solution of the charge neutrality equation and takes into account the following phenomena: several energy levels in the bandgap; Fermi-Dirac statistics for free carriers; screening effects on the dopant ionization energies; the formation of impurity bands. A self-consistent model and a corresponding simulation software have been realized. A preliminary comparison of our calculations with existing experimental results is carried out.

Formato

application/pdf

Identificador

http://amsdottorato.unibo.it/3924/1/scaburri_raffaele_tesi.pdf

urn:nbn:it:unibo-2774

Scaburri, Raffaele (2011) The incomplete ionization of substitutional dopants in Silicon Carbide, [Dissertation thesis], Alma Mater Studiorum Università di Bologna. Dottorato di ricerca in Ingegneria dei materiali <http://amsdottorato.unibo.it/view/dottorati/DOT257/>, 22 Ciclo. DOI 10.6092/unibo/amsdottorato/3924.

Idioma(s)

en

Publicador

Alma Mater Studiorum - Università di Bologna

Relação

http://amsdottorato.unibo.it/3924/

Direitos

info:eu-repo/semantics/openAccess

Palavras-Chave #ING-IND/22 Scienza e tecnologia dei materiali
Tipo

Doctoral Thesis

PeerReviewed