The Dependence of Retention Time on Gate Length in UTBOX FBRAM With Different Source/Drain Junction Engineering


Autoria(s): Nicoletti, Talitha; Aoulaiche, Marc; Almeida, Luciano M.; Santos, Sara D.; Martino, Joao Antonio; Veloso, Anabela; Jurczak, Malgorzata; Simoen, Eddy; Claeys, Cor
Contribuinte(s)

UNIVERSIDADE DE SÃO PAULO

Data(s)

05/11/2013

05/11/2013

2012

Resumo

The floating-body-RAM sense margin and retention-time dependence on the gate length is investigated in UTBOX devices using BJT programming combined with a positive back bias (so-called V th feedback). It is shown that the sense margin and the retention time can be kept constant versus the gate length by using a positive back bias. Nevertheless, below a critical L, there is no room for optimization, and the memory performances suddenly drop. The mechanism behind this degradation is attributed to GIDL current amplification by the lateral bipolar transistor with a narrow base. The gate length can be further scaled using underlap junctions.

Brazilian research-funding agency CAPES

Brazilian research funding agency CAPES

CNPq

CNPq

Identificador

IEEE ELECTRON DEVICE LETTERS, PISCATAWAY, v. 33, n. 7, supl. 1, Part 1, pp. 940-942, JUL, 2012

0741-3106

http://www.producao.usp.br/handle/BDPI/41217

10.1109/LED.2012.2196968

http://dx.doi.org/10.1109/LED.2012.2196968

Idioma(s)

eng

Publicador

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

PISCATAWAY

Relação

IEEE ELECTRON DEVICE LETTERS

Direitos

restrictedAccess

Copyright IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

Palavras-Chave #RETENTION TIME #SCALABILITY #SENSE MARGIN #UNDERLAP #UTBOX #1T-FLOATING-BODY RAM (FBRAM) #DRAIN-LEAKAGE GIDL #ENGINEERING, ELECTRICAL & ELECTRONIC
Tipo

article

original article

publishedVersion