Junction Field Effect on the Retention Time for One-Transistor Floating-Body RAM


Autoria(s): Aoulaiche, Marc; Nicoletti, Talitha; Almeida, Luciano Mendes; Simoen, Eddy; Veloso, Anabela; Blomme, Pieter; Groeseneken, Guido; Jurczak, Malgorzata
Contribuinte(s)

UNIVERSIDADE DE SÃO PAULO

Data(s)

24/10/2013

24/10/2013

2012

Resumo

One-transistor floating-body random access memory retention time distribution is investigated on silicon-on-insulator UTBOX devices. It is shown that the average retention time can be improved by two to three orders of magnitude by reducing the body-junction electric field. However, the retention time distribution, which is mainly caused by the generation-recombination center density variation, remains similar.

Interuniversity Microelectronics Center's Core Partner Program on Emerging Memory Devices: Intel, Micron, Panasonic, Samsung, TSMC, ELPIDA, Hynix, Sony, and FUJITSU

Interuniversity Microelectronics Centers Core Partner Program on Emerging Memory Devices: Intel, Micron, Panasonic, Samsung, TSMC, ELPIDA, Hynix, Sony, and FUJITSU

Identificador

IEEE TRANSACTIONS ON ELECTRON DEVICES, PISCATAWAY, v. 59, n. 8, supl. 4, Part 1, pp. 2167-2172, AUG, 2012

0018-9383

http://www.producao.usp.br/handle/BDPI/35963

10.1109/TED.2012.2200685

http://dx.doi.org/10.1109/TED.2012.2200685

Idioma(s)

eng

Publicador

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

PISCATAWAY

Relação

IEEE TRANSACTIONS ON ELECTRON DEVICES

Direitos

restrictedAccess

Copyright IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

Palavras-Chave #ELECTRIC FIELD #FLOATING BODY #FLOATING-BODY RANDOM ACCESS MEMORY (RAM) (FBRAM) #ONE-TRANSISTOR RAM #RECESSED JUNCTIONS #RETENTION #SILICON ON INSULATOR (SOI) #UNDERLAP JUNCTIONS #UTBOX #RECOMBINATION MODEL #ENGINEERING, ELECTRICAL & ELECTRONIC #PHYSICS, APPLIED
Tipo

article

original article

publishedVersion