Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal
| Contribuinte(s) |
UNIVERSIDADE DE SÃO PAULO |
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| Data(s) |
16/09/2013
16/09/2013
01/02/2012
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| Resumo |
A Co-doped silica film was deposited on the surface of a Si(100) wafer and isothermally annealed at 750 degrees C to form spherical Co nanoparticles embedded in the silica film and a few atomic layer thick CoSi2 nanoplatelets within the wafer. The structure, morphology, and spatial orientation of the nanoplatelets were characterized. The experimental results indicate that the nanoplatelets exhibit hexagonal shape and a uniform thickness. The CoSi2 nanostructures lattice is coherent with the Si lattice, and each of them is parallel to one of the four planes belonging to the {111} crystallographic form of the host lattice. (C) 2012 American Institute of Physics. [doi:10.1063/1.3683493] Brazilian Synchrotron Light Laboratory (LNLS) Brazilian Synchrotron Light Laboratory (LNLS) Brazilian Nanotechnology National Laboratory (LMELNNano) Brazilian Nanotechnology National Laboratory (LME-LNNano) CNPq CNPq FAPESP (Brazil) FAPESP, Brazil ANPCyT ANPCYT [PICT 2008-00038] CONICET, Argentina [PIP 112-200801-03079] CONICET (Argentina) CONICET/CNPq CONICET/CNPq |
| Identificador |
APPLIED PHYSICS LETTERS, MELVILLE, v. 100, n. 6, pp. 1-15, FEB 6, 2012 0003-6951 http://www.producao.usp.br/handle/BDPI/33361 10.1063/1.3683493 |
| Idioma(s) |
eng |
| Publicador |
AMER INST PHYSICS MELVILLE |
| Relação |
APPLIED PHYSICS LETTERS |
| Direitos |
restrictedAccess Copyright AMER INST PHYSICS |
| Palavras-Chave | #X-RAY-SCATTERING #COBALT DISILICIDE #SI #INTERFACE #SURFACE #GROWTH #NANOSTRUCTURES #TEMPERATURE #ROUGHNESS #SILICIDES #PHYSICS, APPLIED |
| Tipo |
article original article publishedVersion |
