Subband mixing inducing negative resistance


Autoria(s): Degani, Marcos H.; Scalvi, Luis V.A.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

27/05/2014

27/05/2014

01/05/1993

Resumo

A new double channel field-effect structure based on delta-doping technology is proposed Resonant tunneling between the channels is employed to control the transport along the interface plane. A realistic simulation is performed for several temperatures. We solve the Schrodinger and Poisson equations self-consistently and have found that a large peak-to-valley ratio in the current-voltage characteristic occurs at the whole range of temperature investigated this effect indicates the potential application of this phenomenon for switching devices, where the transversal conductivity can be controlled due to the coupling between states belonging to different channels.

Formato

301-304

Identificador

http://dx.doi.org/10.1016/0038-1098(93)90377-Y

Solid State Communications, v. 86, n. 5, p. 301-304, 1993.

0038-1098

http://hdl.handle.net/11449/130546

10.1016/0038-1098(93)90377-Y

WOS:A1993LA65800007

2-s2.0-0027593913

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Solid State Communications

Direitos

closedAccess

Palavras-Chave #Doping (additives) #Negative resistance #Switching circuits #Double channel field-effect structures #Resonant tunneling #Subband mixing #Field effect semiconductor devices
Tipo

info:eu-repo/semantics/article