Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation


Autoria(s): Cano de Andrade, Maria Gloria; Martino, Joao Antonio; Aoulaiche, Marc; Collaert, Nadine; Simoen, Eddy; Claeys, Cor
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

18/03/2015

18/03/2015

01/11/2014

Resumo

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

In this paper, the influence of proton irradiation is experimentally studied in triple-gate Bulk FinFETs with and without Dynamic Threshold MOS configuration (DTMOS). The drain current, transconductance, Drain Induced Barrier Lowering (DIBL) and the important figures of merit for the analog performance such as transconductance-over-drain current, output conductance and intrinsic voltage gain will be compared. Furthermore, the Low-Frequency (LF) noise will be also analyzed in the DT mode and the standard biasing configuration. The results indicate that the better electrical characteristics and analog performance of DTMOS FinFETs make them very competitive candidates for low-noise RF analog applications in a radiation environment. (C) 2014 Elsevier Ltd. All rights reserved.

Formato

2349-2354

Identificador

http://dx.doi.org/10.1016/j.microrel.2014.06.013

Microelectronics Reliability. Oxford: Pergamon-elsevier Science Ltd, v. 54, n. 11, p. 2349-2354, 2014.

0026-2714

http://hdl.handle.net/11449/116667

10.1016/j.microrel.2014.06.013

WOS:000346212900001

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Microelectronics Reliability

Direitos

closedAccess

Palavras-Chave #DTMOS FinFETs #Proton irradiation #Analog performance #Low-frequency noise #Flicker noise #Generation-recombination noise
Tipo

info:eu-repo/semantics/article