Electrodeposition of Ni-B and Ni-Co-B Alloys by Using Boric Acid as Boron Source


Autoria(s): Sakita, A. M. P.; Della Noce, R.; Magnani, M.; Fugivara, Cecilio Sadao; Benedetti, Assis Vicente
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

03/12/2014

03/12/2014

01/01/2014

Resumo

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

In this letter, the formation of electrodeposited Ni-B and Ni-Co-B alloys by using boric acid as boron source was demonstrated. The estimated thickness of the films was 5 mu m. By means of Cyclic voltammetry, X-ray diffractometry and energy dispersive X-ray spectroscopy analyzes, it was showed that Ni-B and Ni-Co-B alloys, with composition Ni94B6 and Ni75Co21B4, can be easily formed onto glassy carbon when no complexing agents are employed in the electrodeposition bath. These results open the door to the production of electrodeposited boron-containing alloys by using boric acid as precursor due to its low cost and large-scale production. (C) 2014 The Electrochemical Society. All rights reserved.

Formato

D10-D12

Identificador

http://dx.doi.org/10.1149/2.011405eel

Ecs Electrochemistry Letters. Pennington: Electrochemical Soc Inc, v. 3, n. 5, p. D10-D12, 2014.

2162-8726

http://hdl.handle.net/11449/113158

10.1149/2.011405eel

WOS:000333804400006

WOS000333804400006.pdf

Idioma(s)

eng

Publicador

Electrochemical Soc Inc

Relação

Ecs Electrochemistry Letters

Direitos

openAccess

Tipo

info:eu-repo/semantics/article