Electrodeposition of Ni-B and Ni-Co-B Alloys by Using Boric Acid as Boron Source
Contribuinte(s) |
Universidade Estadual Paulista (UNESP) |
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Data(s) |
03/12/2014
03/12/2014
01/01/2014
|
Resumo |
Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) In this letter, the formation of electrodeposited Ni-B and Ni-Co-B alloys by using boric acid as boron source was demonstrated. The estimated thickness of the films was 5 mu m. By means of Cyclic voltammetry, X-ray diffractometry and energy dispersive X-ray spectroscopy analyzes, it was showed that Ni-B and Ni-Co-B alloys, with composition Ni94B6 and Ni75Co21B4, can be easily formed onto glassy carbon when no complexing agents are employed in the electrodeposition bath. These results open the door to the production of electrodeposited boron-containing alloys by using boric acid as precursor due to its low cost and large-scale production. (C) 2014 The Electrochemical Society. All rights reserved. |
Formato |
D10-D12 |
Identificador |
http://dx.doi.org/10.1149/2.011405eel Ecs Electrochemistry Letters. Pennington: Electrochemical Soc Inc, v. 3, n. 5, p. D10-D12, 2014. 2162-8726 http://hdl.handle.net/11449/113158 10.1149/2.011405eel WOS:000333804400006 WOS000333804400006.pdf |
Idioma(s) |
eng |
Publicador |
Electrochemical Soc Inc |
Relação |
Ecs Electrochemistry Letters |
Direitos |
openAccess |
Tipo |
info:eu-repo/semantics/article |