CaCu3Ti4O12 thin films with non-linear resistivity deposited by RF-sputtering
Contribuinte(s) |
Universidade Estadual Paulista (UNESP) |
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Data(s) |
27/05/2014
27/05/2014
11/07/2013
|
Resumo |
Calcium copper titanate, CaCu3Ti4O12, CCTO, thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO2/Si (100) substrates at a room temperature followed by annealing at 600 °C for 2 h in a conventional furnace. The CCTO thin film present a cubic structure with lattice parameter a = 7.379 ±0.001 Å free of secondary phases. The observed electrical features of CCTO thin films are highly dependent on the [CaO12], [CaO 4], [CuO11], [CuO11Vx 0] and [TiO5.VO] clusters. The CCTO film capacitor showed a dielectric loss of 0.40 and a dielectric permittivity of 70 at 1 kHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. © 2013 Elsevier B.V. All rights reserved. |
Formato |
604-608 |
Identificador |
http://dx.doi.org/10.1016/j.jallcom.2013.05.216 Journal of Alloys and Compounds, v. 574, p. 604-608. 0925-8388 http://hdl.handle.net/11449/75949 10.1016/j.jallcom.2013.05.216 WOS:000321749600097 2-s2.0-84879825033 |
Idioma(s) |
eng |
Relação |
Journal of Alloys and Compounds |
Direitos |
closedAccess |
Palavras-Chave | #Chemical synthesis #Electron microscopy #Thin films #X-ray diffraction #Calcium copper titanates #Conventional furnace #Cubic structure #Dielectric permittivities #Interfacial barriers #Polycrystalline #Room temperature #Secondary phasis #Dielectric losses #Permittivity #Synthesis (chemical) #X ray diffraction |
Tipo |
info:eu-repo/semantics/article |