CaCu3Ti4O12 thin films with non-linear resistivity deposited by RF-sputtering


Autoria(s): Foschini, C. R.; Tararam, R.; Simões, A. Z.; Cilense, M.; Longo, Elson; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

27/05/2014

27/05/2014

11/07/2013

Resumo

Calcium copper titanate, CaCu3Ti4O12, CCTO, thin films with polycrystalline nature have been deposited by RF sputtering on Pt/Ti/SiO2/Si (100) substrates at a room temperature followed by annealing at 600 °C for 2 h in a conventional furnace. The CCTO thin film present a cubic structure with lattice parameter a = 7.379 ±0.001 Å free of secondary phases. The observed electrical features of CCTO thin films are highly dependent on the [CaO12], [CaO 4], [CuO11], [CuO11Vx 0] and [TiO5.VO] clusters. The CCTO film capacitor showed a dielectric loss of 0.40 and a dielectric permittivity of 70 at 1 kHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. © 2013 Elsevier B.V. All rights reserved.

Formato

604-608

Identificador

http://dx.doi.org/10.1016/j.jallcom.2013.05.216

Journal of Alloys and Compounds, v. 574, p. 604-608.

0925-8388

http://hdl.handle.net/11449/75949

10.1016/j.jallcom.2013.05.216

WOS:000321749600097

2-s2.0-84879825033

Idioma(s)

eng

Relação

Journal of Alloys and Compounds

Direitos

closedAccess

Palavras-Chave #Chemical synthesis #Electron microscopy #Thin films #X-ray diffraction #Calcium copper titanates #Conventional furnace #Cubic structure #Dielectric permittivities #Interfacial barriers #Polycrystalline #Room temperature #Secondary phasis #Dielectric losses #Permittivity #Synthesis (chemical) #X ray diffraction
Tipo

info:eu-repo/semantics/article