Structural, dielectric and ferroelectric properties of Nb-doped PZT thin films produced by oxide precursor method


Autoria(s): Araújo, E. B.; Eiras, J. A.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

27/05/2014

27/05/2014

01/01/2002

Resumo

Recently, was proposed a chemical method for preparation of ferroelectric thin films based on oxide precursors. In this work, PZT thin films were prepared to attest the viability of this method for cation-substitution. In this study, a small concentration of Nb (5 mol%) was selected as substitute of B-site in ABO 3 structure of PZT. Dielectric and ferroelectric properties of PZT films were studied as a function of cation-substitution. Results for Nb-PZT were compared with PZT films undoped. The values of dielectric constant, at typical 100 kHz frequency, were 358 and 137, for PZT and Nb-PZT films respectively. Remanent polarizations of these films were respectively 7.33 μ C/cm 2 and 13.3 μ C/cm 2 , while the measured coercive fields were 101 kV/cm and 93 kV/cm. As a result, changes on observed dielectric and ferroelectric values confirm the Nb substitution in PZT thin film produced by oxide precursor method. © 2002 Taylor & Francis.

Formato

51-56

Identificador

http://dx.doi.org/10.1080/713716104

Ferroelectrics, v. 270, p. 51-56.

0015-0193

1563-5112

http://hdl.handle.net/11449/66760

10.1080/00150190211254

WOS:000176862200010

2-s2.0-33746290172

Idioma(s)

eng

Relação

Ferroelectrics

Direitos

closedAccess

Palavras-Chave #Ferroelectric #PZT #Thin films #Dielectric properties #Ferroelectricity #Lead compounds #Permittivity #Polarization #Substitution reactions #Cation-substitution #Oxide precursor method #Remanent polarizations
Tipo

info:eu-repo/semantics/conferencePaper