Thermal decomposition of vanadyl Schiff-base compounds


Autoria(s): David, H. L.; Lonashiro, M.; Benedetti, Assis Vicente; Zamian, J. R.; Dockal, E. R.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

27/05/2014

27/05/2014

19/06/1992

Resumo

The thermal stability and thermal decomposition of several Schiff bases coordinated to vanadyl, VO (Schiff base), were studied by thermogravimetry and conventional gas Chromatographic and X-ray analyses. The kinetics, the number of steps and, in particular, the final temperature of decomposition of these complexes depend on the equatorial ligand. © 1992.

Formato

45-50

Identificador

http://dx.doi.org/10.1016/0040-6031(92)85148-O

Thermochimica Acta, v. 202, n. C, p. 45-50, 1992.

0040-6031

http://hdl.handle.net/11449/64240

10.1016/0040-6031(92)85148-O

2-s2.0-0040829299

Idioma(s)

eng

Relação

Thermochimica Acta

Direitos

closedAccess

Tipo

info:eu-repo/semantics/article