Dielectric properties of soft chemical method derived CaCu3Ti4O12 thin films onto Pt/TiO2/Si(100) substrates


Autoria(s): Moura, F.; Aguiar, E. C.; Longo, Elson; Varela, José Arana; Simões, Alexandre Zirpoli
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

03/03/2011

Resumo

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Calcium copper titanate, CaCu3Ti4O12 (CCTO), thin film has been deposited by the soft chemical method on Pt/Ti/SiO2/Si (1 0 0) substrates at 700 degrees C for 2 h. The peaks were indexed as cubic phase belonging to the Im-3 space group. The film exhibited a duplex microstructure consisting of large grains of 130 nm in length and regions of fine grains (less than 80 nm). The CCTO film capacitor showed a dielectric loss of 0.031 and a dielectric permittivity of 1020 at 1 MHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. Based on impedance analyses, the equivalent circuit of CCTO film consisting of a resistor connected in series with two resistor-capacitor (RC) elements. (C) 2011 Elsevier B.V. All rights reserved.

Formato

3817-3821

Identificador

http://dx.doi.org/10.1016/j.jallcom.2010.12.184

Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 509, n. 9, p. 3817-3821, 2011.

0925-8388

http://hdl.handle.net/11449/42526

10.1016/j.jallcom.2010.12.184

WOS:000287968000021

WOS000287968000021.pdf

Idioma(s)

eng

Publicador

Elsevier B.V. Sa

Relação

Journal of Alloys and Compounds

Direitos

openAccess

Palavras-Chave #Thin films #Dielectrics #Chemical synthesis #X-ray diffraction
Tipo

info:eu-repo/semantics/article