Dielectric properties of soft chemical method derived CaCu3Ti4O12 thin films onto Pt/TiO2/Si(100) substrates
Contribuinte(s) |
Universidade Estadual Paulista (UNESP) |
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Data(s) |
20/05/2014
20/05/2014
03/03/2011
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Resumo |
Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Calcium copper titanate, CaCu3Ti4O12 (CCTO), thin film has been deposited by the soft chemical method on Pt/Ti/SiO2/Si (1 0 0) substrates at 700 degrees C for 2 h. The peaks were indexed as cubic phase belonging to the Im-3 space group. The film exhibited a duplex microstructure consisting of large grains of 130 nm in length and regions of fine grains (less than 80 nm). The CCTO film capacitor showed a dielectric loss of 0.031 and a dielectric permittivity of 1020 at 1 MHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. Based on impedance analyses, the equivalent circuit of CCTO film consisting of a resistor connected in series with two resistor-capacitor (RC) elements. (C) 2011 Elsevier B.V. All rights reserved. |
Formato |
3817-3821 |
Identificador |
http://dx.doi.org/10.1016/j.jallcom.2010.12.184 Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 509, n. 9, p. 3817-3821, 2011. 0925-8388 http://hdl.handle.net/11449/42526 10.1016/j.jallcom.2010.12.184 WOS:000287968000021 WOS000287968000021.pdf |
Idioma(s) |
eng |
Publicador |
Elsevier B.V. Sa |
Relação |
Journal of Alloys and Compounds |
Direitos |
openAccess |
Palavras-Chave | #Thin films #Dielectrics #Chemical synthesis #X-ray diffraction |
Tipo |
info:eu-repo/semantics/article |