Strain behavior of lanthanum modified BiFeO3 thin films prepared via soft chemical method


Autoria(s): Simões, Alexandre Zirpoli; Aguiar, E. C.; Gonzalez, A. H. M.; Andres, J.; Longo, Elson; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

15/11/2008

Resumo

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Pure and lanthanum modified BFO (LaxBi1-xFeO3, x=0.0, 0.08, 0.15, 0.30) thin films were fabricated on Pt(111)/Ti/SiO2/Si substrates by the soft chemical method. The effect of La substitution on the structural and electrical properties was studied. Scanning electron microscopy, x-ray diffraction, and Raman spectroscopy have been employed to characterize the thin films while the piezoelectric measurements were carried out using a setup based on an atomic force microscope. It was found that La-doped BFO thin films exhibited good ferroelectric properties, such as improved leakage current density and retention-free characteristics. The unipolar strain is strongly reduced by the amount of lanthanum added to the system.

Formato

6

Identificador

http://dx.doi.org/10.1063/1.3029658

Journal of Applied Physics. Melville: Amer Inst Physics, v. 104, n. 10, p. 6, 2008.

0021-8979

http://hdl.handle.net/11449/42399

10.1063/1.3029658

WOS:000262605800118

WOS000262605800118.pdf

Idioma(s)

eng

Publicador

American Institute of Physics (AIP)

Relação

Journal of Applied Physics

Direitos

openAccess

Palavras-Chave #annealing #antiferromagnetic materials #atomic force microscopy #bismuth compounds #dielectric polarisation #ferroelectric switching #ferroelectric thin films #lanthanum compounds #leakage currents #multiferroics #piezoelectricity #platinum #Raman spectra #scanning electron microscopy #silicon #silicon compounds #titanium #X-ray diffraction
Tipo

info:eu-repo/semantics/article