Structural and electrical properties of SrBi2(Ta0.5Nb0.5)(2)O-9 thin films


Autoria(s): Amsei Junior, N. L.; Simões, Alexandre Zirpoli; Pianno, R. F. C.; Zanetti, S. M.; Longo, Elson; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

30/06/2008

Resumo

SrBi2(Ta0.5Nb0.5)(2)O-9 (SBTN) thin films were obtained by polymeric precursor method on Pt/Ti/SiO2/Si(1 0 0) substrates. The film is dense and crack-free after annealing at 700 degrees C for 2 h in static air. Crystallinity and morphological characteristic were examined by X-ray diffraction (XRD), field emission scanning electron microscopy (FEG-SEM) and atomic force microscopy (AFM). The films displayed rounded grains with a superficial roughness of 3.5 nm. The dielectric permittivity was 122 with loss tangent of 0.040. The remanent polarization (P-r) and coercive field (E-c) were 5.1 mu C/cm(2) and 96 kV/cm, respectively. (C) 2007 Published by Elsevier B.V.

Formato

500-503

Identificador

http://dx.doi.org/10.1016/j.jallcom.2007.04.039

Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 458, n. 1-2, p. 500-503, 2008.

0925-8388

http://hdl.handle.net/11449/41140

10.1016/j.jallcom.2007.04.039

WOS:000256641200088

Idioma(s)

eng

Publicador

Elsevier B.V. Sa

Relação

Journal of Alloys and Compounds

Direitos

closedAccess

Palavras-Chave #ferroelectric #chemical synthesis #thin films #nanostructures
Tipo

info:eu-repo/semantics/article