A Novel Plasma Technique for Surface Treatment: The Plasma Expander


Autoria(s): Rangel, Elidiane C.; Machida, Munemasa; Durrant, Steven F.; Cruz, Nilson C.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/02/2012

Resumo

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

This paper describes a new plasma treatment method: the plasma expander. In this approach, expanding shock waves are generated in a vacuum chamber by pulsed plasmas. Collisions of fast species in the waves modify the properties of solid surfaces exposed to the plasma. The degree of such modification is governed by the energy delivered by the plasma exposure. To confirm the efficacy of this approach, modifications induced in the properties of thin polymer films produced by plasma-enhanced chemical vapor deposition by exposure to nitrogen plasma shock waves were investigated. The films were prepared from benzene radio frequency plasmas and subsequently exposed to different quantities of nitrogen shock waves N-w. The effects of N-w on the wettability, molecular structure, and mechanical properties of the films were studied. Fourier transform infrared spectroscopy revealed that greater N-w resulted in the loss of C-H groups and the rupture of benzene aromatic rings observed in the structure of the as-deposited films. Furthermore, the contact angle strongly increased and the hardness, evaluated by nanoindentation, increased up to fourfold with the increase in the intensity of the treatment.

Formato

492-496

Identificador

http://dx.doi.org/10.1109/TPS.2011.2178272

IEEE Transactions on Plasma Science. Piscataway: IEEE-Inst Electrical Electronics Engineers Inc, v. 40, n. 2, p. 492-496, 2012.

0093-3813

http://hdl.handle.net/11449/40277

10.1109/TPS.2011.2178272

WOS:000300429800011

Idioma(s)

eng

Publicador

Institute of Electrical and Electronics Engineers (IEEE)

Relação

IEEE Transactions on Plasma Science

Direitos

closedAccess

Palavras-Chave #Plasma-enhanced chemical vapor deposition (PECVD) #plasma expander #plasma treatment #surface treatment #thin films
Tipo

info:eu-repo/semantics/article