Photoluminescence in amorphous (PbLa)TiO3 thin films deposited on different substrates


Autoria(s): Rangel, J. H.; Carreno, NLV; Leite, E. R.; Longo, Elson; Campos, CEM; Lanciotti, F.; Pizani, P. S.; Varela, José Arana
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

01/09/2002

Resumo

Pb1-XLaXTiO3 thin films, (X = 0.0; 13 and 0.27 mol%) were prepared by the polymeric precursor method. Thin films were deposited on Pt/Ti/SiO2/Si (1 1 1), Si (1 0 0) and glass substrates by spin coating, and annealed in the 200-300degreesC range in an O-2 atmosphere. X-ray diffraction, scanning electron microscopy and atomic force microscopy were used for the microstructural characterization of the thin films. Photoluminescence (PL) at room temperature has been observed in thin films of (PbLa)TiO3. The films deposited on Pt/Ti/SiO2/Si substrates present PL intensity greater than those deposited on glass and silicon substrates. The intensity of PL in these thin films was found to be dependent on the thermal treatment and lanthanum molar concentration. (C) 2002 Elsevier B.V. B.V. All rights reserved.

Formato

85-90

Identificador

http://dx.doi.org/10.1016/S0022-2313(02)00295-8

Journal of Luminescence. Amsterdam: Elsevier B.V., v. 99, n. 2, p. 85-90, 2002.

0022-2313

http://hdl.handle.net/11449/40025

10.1016/S0022-2313(02)00295-8

WOS:000177829500001

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Journal of Luminescence

Direitos

closedAccess

Palavras-Chave #photoluminescence #thin films #(PbLa)TiO3
Tipo

info:eu-repo/semantics/article