Effects of helium ion irradiation on fluorinated plasma polymers


Autoria(s): Lopes, Bruno B.; Schreiner, Wido; Davanzo, Celso U.; Durrant, Steven F.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

25/06/2010

Resumo

The effects of ion irradiation on fluorinated plasma polymer films are investigated using profilometry, surface contact-angle measurements, infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS). Remarkably, helium plasma immersion ion implantation (PIII) of several amorphous hydrogenated fluorinated plasma polymers deposited from C(2)H(2)-SF(6), C(6)H(6)-SF(6) or C(6)F(6) produces film compactions of up to 40%, and modifies the surface energy in the 35 to 65 dyn cm(-1) range. As revealed by IRRAS and XPS, the films contain C-H, C-C, C=C, C=O, O-H and C-F groups. XPS spectra confirm the presence of N (typically similar to 5%). The films produced from SF(6)-containing plasmas also contain S. For irradiation times of 80 min, the film carbon content is increased, and the fluorine content is greatly reduced, by factors of about 3 to 15, depending on the initial film composition. (C) 2010 Elsevier B.V. All rights reserved.

Formato

3059-3063

Identificador

http://dx.doi.org/10.1016/j.surfcoat.2010.02.016

Surface & Coatings Technology. Lausanne: Elsevier B.V. Sa, v. 204, n. 18-19, p. 3059-3063, 2010.

0257-8972

http://hdl.handle.net/11449/39845

10.1016/j.surfcoat.2010.02.016

WOS:000279378600039

Idioma(s)

eng

Publicador

Elsevier B.V. Sa

Relação

Surface & Coatings Technology

Direitos

closedAccess

Palavras-Chave #PECVD #Ion implantation #Fluorinated thin films #Plasma polymers #XPS #IRRAS
Tipo

info:eu-repo/semantics/article