Low voltage electroluminescence of terbium- and thulium-doped zinc oxide films


Autoria(s): Lima, SAM; Davolos, Marian Rosaly; Legnani, C.; Quirino, W. G.; Cremona, M.
Contribuinte(s)

Universidade Estadual Paulista (UNESP)

Data(s)

20/05/2014

20/05/2014

20/07/2006

Resumo

Strong interest in developing technology for visual information. stimulates research for thin film electroluminescent devices. Here, for the first time, we report that thulium- and terbium-doped zinc-oxide films are suitable for electroluminescence applications. Two different devices were assembled as lTO/LiF/ZnO:RE/LiF/Al or ITO/SiO2/ZnO:RE/SiO2/Al, where ZnO:RE is a film of zinc oxide containing 10 at% of Tb3+ or Tm3+. Electroluminescence spectra show that besides a broad emission band with maximum around 650 nm assigned to ZnO, also emission lines from Tb3+ at 484 nm (D-5(4) -> F-7(6)), 543 nm (D-5(4) -> F-7(6)), and 589 nm (D-5(4) -> F-7(4)), or from Tm3+ at 478 nm ((1)G(4) -> H-3(6)), and 511 mn (D-1(2) -> H-3(5)) were detected. Intensity of emission as function of applied voltage and current-voltage characteristic are shown and discussed. (c) 2005 Elsevier B.V. All rights reserved.

Formato

35-38

Identificador

http://dx.doi.org/10.1016/j.jallcom.2005.10.066

Journal of Alloys and Compounds. Lausanne: Elsevier B.V. Sa, v. 418, n. 1-2, p. 35-38, 2006.

0925-8388

http://hdl.handle.net/11449/39670

10.1016/j.jallcom.2005.10.066

WOS:000238781500006

Idioma(s)

eng

Publicador

Elsevier B.V.

Relação

Journal of Alloys and Compounds

Direitos

closedAccess

Palavras-Chave #thin films #semiconductors #chemical synthesis #electronical transport #luminescence
Tipo

info:eu-repo/semantics/article